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BIOMACROMOLECULES · 2024 · IF 5.5

Application of an Injectable Thermosensitive Hydrogel Drug Delivery System for Degenerated Intervertebral Disc Regeneration

Yuheng Liu,Chuan Guo,Yu Wang,Qing-Quan Kong

Intervertebral disc degeneration is characterized by a localized, chronic inflammatory response leading to a synthesis/catabolism imbalance within the nucleus pulposus (NP) and progressive functional impairment within the NP. Polyphenol molecules have been widely used in anti-inflammatory therapies in recent years; therefore, we designed an injectable, temperature-sensitive hydrogel PLGA-PEG-PLGA-based drug delivery system for local and sustained delivery of two drugs tannic acid (TA) and resveratrol (Res), with the hydrogel carrying TA directly and Res indirectly (carried directly by inflammation-responsive nanoparticles). The delivery system presents good injectability at room temperature and forms a gel in situ upon entering the intervertebral disc. The delivery system can rapidly release TA and sustain Res release. In vitro and in vivo experiments have shown that this hydrogel drug delivery system is effective in anti-inflammation of degenerated intervertebral discs and promotes the regeneration of extracellular matrix in the NP.

CAS / MDL: 301-10-0
研究领域: 生物医学工程 · 药剂学 · 组织工程
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CHEMICAL RESEARCH IN CHINESE UNIVERSITIES · 2015 ·Vol. 31 ·期 4 ·585-589 · IF 0.875

Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid

Wei Qi,Wang Liyuan

Molecular glass resist has been considered as one of the best choices for a new generation of lithography. In this work, a new type of photoactive compound was obtained by the esterification of tannic acid with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl) and ditertbutyl dicarbonate. The new obtained compound possessed both a photosensitive group of diazonaphthoquinone sulfonate(2,1,4-DNQ) and a group of acidolytic protection. Upon the irradiation of the compound under 365 nm light, the former group was photolyzed and converted into indene carboxylic acid along with a small amount of sulfonic acid, which could lead to the deprotection of the latter group. As a result, a novel i-line molecular glass photoresist was formed with the chemical modification of tannic acid. The experimental results show that the modificated compound had a fair solubility in many organic solvents. The lithographic performance of the resist was evaluated on an i-line exposure system with high photosensitivity and resolution as well.

研究领域: 材料科学 · 微纳加工 · 高分子化学 · 光电子学 · 半导体工艺
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