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Materials · 2023 ·Vol. 16 ·期 9 ·3395 · IF 3.4

Structure and Performance Optimization of Co Magnetic Thin Films Deposited by Vacuum Evaporation Coating

Mingheng Mao,Shaoqiu Ke,Dingguo Tang,Xiahan Sang,Danqi He

Co magnetic films are widely used in high-frequency magnetic recording and vertical magnetic recording due to their high saturation magnetization and magnetocrystalline anisotropy. In this work, ferromagnetic Co magnetic films were prepared on copper substrate by vacuum evaporation combined with heat treatment (H2atmosphere), to investigate the impact of film thickness and annealing temperature on microstructure and magnetic properties. The results show that with the increase in annealing temperature, the Co thin film physical phase does not change significantly, the crystallinity increases, and the grain size increases, which is consistent with the results obtained from the SEM morphology map of the sample surface, leading to an increase in coercivity. By annealing experiments (atmospheric atmosphere) on Co magnetic films with and without an Al protective layer, as shown by scanning electron microscopy microscopic characterization results, it was verified that the Al layer can protect the inner Co layer from oxidation. As the film thickness increases from 10 to 300 nm, the magnetic properties of Co films change significantly. The saturation magnetization gradually increases from 0.89 to 5.21 emu/g, and the coercivity increases from 124.3 to 363.8 Oe. The remanence ratio of the 10 nm magnetic film is 0.82, which is much higher than the film remanence ratio of 0.46 at 50 nm. This is because when the thickness of the film is between 10 and 50 nm, the magnetic moments partially deviate from the in-plane direction, and the out-of-plane component reduces the film remanence ratio. This study shows that optimizing annealing temperature and film thickness can effectively control the structure and magnetic properties of Co magnetic films, which is of great significance for the development of the magnetic recording field.Keywords:magnetic films;annealing;vacuum evaporation coating;remanence ratio

CAS / MDL: 7440-48-4 7429-90-5
研究领域: 材料科学 · 物理学
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JOURNAL OF ALLOYS AND COMPOUNDS · 2023 · IF 6.2

High remanence ratio of aluminum substituted hexagonal barium ferrite films for self-biased microwave devices

Bin Xie,Xiaoyuan Zhou,Wei Chen,Lining Fan,Lixin Zhang,Runqiu Li,Hui Zheng,Qiong Wu,Yanhui Wu,Yaning Lin,Peng Zheng,Liang Zheng,Yang Zhang

A high remanence ratio of hexagonal barium ferrite film is urgently needed for self-biased microwave devices. In this work, the aluminum-substituted hexagonal barium ferrite films (BaFe (12−x) Al x O 19 ) with different substituting concentrations (x = 0, 1.5, 2, 2.5, 3) were deposited on the Al 2 O 3 substrate by pulsed laser deposition method using self-sintered BaFe (12−x) Al x O 19 target. Firstly, the targets with different Al concentrations were sintered by the solid phase method and exhibited high dense, uniform microstructure, and high purity. Then, the influence of the Al ions concentration on the crystal structure, morphology, and magnetic and microwave properties of BaFe (12−x) Al x O 19 films was studied in detail. Structural characterizations confirm that the Al prefers to substitute for 2a, 4f2 and 2b sites and promotes the grain (formed as single-domain) orientation growth, which results in a decrease in the saturation magnetization, an increase of remanence ratio and anisotropy field. Consequently, a high remanence ratio of 95 % was obtained for BaFe (12−x) Al x O 19 film at x = 3, and also displays a high anisotropy field (27.7 kOe), a low saturation magnetization (1758 G) and an appropriate ferromagnetic resonance linewidth (~436 Oe), which can be applied in self-biased devices.

研究领域: 材料科学 · 磁学 · 电子工程
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