CHINESE SCIENCE BULLETIN
·
2014
·Vol. 59
·期 11
·1097-1103
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IF 1.365
Liu Juan,Liu Zhengping,Wang Liyuan,Sun Haiyan
Calix[4]resorcinarene, prepared by the acid-catalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix[4]resorcinarene were partly protected by tert-butoxycarbonyl ( t -BOC) and then esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl). Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The generated sulfonic acid can further catalyze the deprotection of the t -BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The lithographic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.
研究领域:
材料科学
·
化学工程
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DOI
高影响因子
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH
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2018
·
IF 3.141
Xiangfei Zheng,Changwei Ji,Jingcheng Liu,Ren Liu,Qidao Mu,Xiaoya Liu
Xanthate-mediated reversible addition–fragmentation chain transfer (RAFT) methodologies have been applicable to preparation of branched or star polymers. In this article, novel star copolymers have been synthesized through xanthate-mediated RAFT polymerization with p-acetoxystyrene and tert-butyl acrylate. Fourier transfer infrared, nuclear magnetic resonance spectra, and gas chromatography analyses indicated that the polymerization was successful between both of the monomers and the star RAFT agent. The intrinsic viscosity and Zimm branching factor (g′) were used to confirm the copolymers’ architecture. The ultraviolet absorbance of the copolymer solutions indicated that the copolymer was suitable for use as a krypton fluoride (KrF) laser photoresist. Moreover, the photolithography performance of the positive-tone chemically amplified photoresist was evaluated. The results indicated that the photosensitive based on the star copolymer was higher than the linear one, and the pattern resolution was around 200 nm at a low exposure energy.
研究领域:
材料科学
·
高分子化学
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产品关联
DOI
高影响因子
Journal of Materials Chemistry C
·
2012
·Vol. 1
·期 6
·1160-1167
·
IF 0
Jinxing Yu,Na Xu,Qi Wei,Liyuan Wang
Polyaddition reactions of N-hydroxy maleopimarimide with divinyl ether compounds were carried out to give novel polymers with ester acetal linkages in the main chain. The polymers have good solubility in common organic solvents and relatively high Tg temperatures. The number-average molecular weights of the polymers range from 4000 to 5500, with Mw/Mn of 1.7–2.3. The thermal decomposition temperatures of the polymers are above 220 °C. The film of the obtained polymers showed excellent transparency to UV light above 230 nm. The ester acetal linkage of the polymer chain can be cleaved in the presence of strong acid under mild heating. Making use of the high acidolytic activity of the polymers, positive-tone chemically amplified i-line photoresists can be formed from them and 2,1-diazonaphthoquinone-4-sulfonate, in which the well known photoactive compound can also function as a photoacid generator. The photolithographic performance of the photoresists was evaluated using an i-line exposure system with high photosensitivity and resolution.
研究领域:
材料科学
·
光刻技术
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产品关联
DOI
Small
·
2025
·
IF 12.1
Yue Liu,Dong Wang,Haihua Wang,Huan Chen,Qianqian Wang,Wenbing Kang
The inherent acid diffusion during post-exposure baking poses significant challenges in balancing resolution, line-edge roughness, and sensitivity (RLS), thereby constraining the performance of chemically amplified photoresists (CARs) in advanced lithography. This study introduces a novel series of alkene-functionalized imino/imido benzenesulfonate photoacid generators (PAGs), characterized by their solubility, thermal stability, and polymerization attributes. These derivatives can copolymerize with acrylates and methacrylates to form PAG-bound copolymers, integrating non-ionic PAG units and acid-cleavable bulky alicyclic substituents, facilitating their use as “single-component” resists devoid of additives. Upon exposure to electron beams or ultraviolet radiation, the sulfonamide esters undergo N─O bond scission, producing photoacids that catalyze the deprotection of acidolytic groups. Compared to PAG-blended systems, these PAG-bound systems curtail acid diffusion by generating long-chain sulfonic acids, while preserving high sensitivity. The formulated single-component CARs demonstrate superior resolution and roughness, achieving a minimum linewidth of 42 nm at an electron beam dose of 73 µC cm − 2 . This research provides a rational design for polymerizable imino/imido benzenesulfonate PAGs and single-component CARs, offering a viable solution to the RLS problem.
研究领域:
材料科学
·
光刻技术
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产品关联
DOI
PubMed
高影响因子
ACS Applied Materials & Interfaces
·
2012
·
IF 4.525
Jinxing Yu,Na Xu,Zhengping Liu,Liyuan Wang
Maleopimaric acid, cycloaddition reaction product of rosin with maleic anhydride, was reacted with hydroxylamine to afford N-hydroxy maleopimarimide, which was then further esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl) to give N-hydroxy maleopimarimide sulfonate. The carboxylic acid group of the compound was then protected by the reaction of this compound with vinyl ether compounds to give the corresponding molecular glass compounds. Upon irradiation to 365 nm light, the 2,1,4-DNQ group undergo photolysis not only to be converted into indene carboxylic acid but also generate a few amount of sulfonic acid which can catalyze the deprotection of the acid labile group. So, novel one-component positive-tone chemically amplified i-line photoresists can be formed by the molecular glass compounds. The lithographic performance of the resists was evaluated using i-line exposure system with high photosensitivity and resolution.
研究领域:
材料科学
·
光刻技术
✓ 已验证
产品关联
DOI
PubMed
高影响因子
POLYMER BULLETIN
·
2016
·Vol. 74
·期 4
·1091-1101
·
IF 1.371
Li Hu,Zhou Zhen,Liu Jingcheng,Xu Wenjia,Liu Ren,Liu Xiaoya
Positive chemically amplified molecular glass with pendant t -butyloxy carbonyl ( t -BOC) groups based on β-cyclodextrin (β-CD) was prepared. The β-CD derivatives were obtained from the reaction of β-CD and di- tert -butyl dicarbonate (DBDC) in the presence of 4-dimethylaminopyridine, and the protecting ratio was controlled using various feed amounts of DBDC. Fourier-transform infrared spectroscopy and proton nuclear magnetic resonance were employed to characterize the chemical structure, indicating that the synthesis was successful. Thermal behavior was characterized by thermogravimetric analysis; the results showed that the initial thermal decomposition temperature occurred at approximately 160 °C, which could satisfy the lithography process. Ultraviolet–visible spectrophotometer indicated that the t -BOC-protected β-CD derivatives had low absorbance at 365 nm wavelength. Additionally, X-ray diffraction analysis results showed that the β-CD derivatives had amorphous form, and exhibited excellent film-forming property. The photoresists consisting of different t -BOC protecting groups showed high sensitivity when exposed to 365 nm light and post-baked at 105 °C for 90 s, followed by developing in 2.38 wt% aqueous tetramethylammonium hydroxide solution at room temperature. An enhanced line and space positive patterns with 1 μm resolution were delineated according to digital microscope.
研究领域:
材料科学
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光刻技术
·
有机化学
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产品关联
DOI
高影响因子
ACS Applied Materials & Interfaces
·
2022
·
IF 10.383
Zhihao Wang,Jinping Chen,Tianjun Yu,Yi Zeng,Xudong Guo,Shuangqing Wang,Timothée Allenet,Michaela Vockenhuber,Yasin Ekinci,Guoqiang Yang,Yi Li
Nonchemically amplified resists based on triphenyl sulfonium triflate-modified polystyrene (PSTS) were prepared by a facile method of modification of polystyrene with sulfonium groups. The uploading of the sulfonium group can be well-controlled by changing the feed ratio of raw materials, resulting in PSTS0.5 and PSTS0.7 resists with sulfonium ratios of 50 and 70%, respectively. The optimum developer (methyl isobutyl ketone/ethanol = 1:7) is obtained by analyzing contrast curves of electron beam lithography (EBL). PSTS0.7 exhibits a better resolution (18 nm half-pitch (HP)) than the PSTS0.5 resist (20 nm HP) at the same developing conditions for EBL. This novel resist platform was further evaluated by extreme ultraviolet lithography, and patterning performance down to 13 nm HP at a dose of 186 mJ cm–2 with a line edge roughness of 2.8 nm was achieved. Our detailed study of the reaction and patterning mechanism suggests that the decomposition of the polar triflate and triphenyl sulfonium groups into nonpolar sulfide or polystyrene plays an important role in the solubility switch.
研究领域:
材料科学
·
纳米技术
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光刻技术
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DOI
高影响因子
CHEMICAL RESEARCH IN CHINESE UNIVERSITIES
·
2015
·Vol. 31
·期 4
·585-589
·
IF 0.875
Wei Qi,Wang Liyuan
Molecular glass resist has been considered as one of the best choices for a new generation of lithography. In this work, a new type of photoactive compound was obtained by the esterification of tannic acid with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl) and ditertbutyl dicarbonate. The new obtained compound possessed both a photosensitive group of diazonaphthoquinone sulfonate(2,1,4-DNQ) and a group of acidolytic protection. Upon the irradiation of the compound under 365 nm light, the former group was photolyzed and converted into indene carboxylic acid along with a small amount of sulfonic acid, which could lead to the deprotection of the latter group. As a result, a novel i-line molecular glass photoresist was formed with the chemical modification of tannic acid. The experimental results show that the modificated compound had a fair solubility in many organic solvents. The lithographic performance of the resist was evaluated on an i-line exposure system with high photosensitivity and resolution as well.
研究领域:
材料科学
·
微纳加工
·
高分子化学
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光电子学
·
半导体工艺
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DOI
高影响因子
MICROCHIMICA ACTA
·
2020
·Vol. 187
·期 4
·1-9
·
IF 6.232
Guo Ruya,Huang Fengchun,Cai Gaozhe,Zheng Lingyan,Xue Li,Li Yanbin,Liao Ming,Wang Maohua,Lin Jianhan
A colorimetric immunosensor was developed for the determination of Salmonella Typhimurium using rotating magnetic separation, gold nanorod (GNR) indication, and click chemistry amplification. The target bacteria were first separated from large-volume sample using a rotating magnetic field and a small amount (50 μg) of immunomagnetic nanoparticles (MNPs), resulting in the forming of magnetic bacteria. Then, the magnetic bacteria were conjugated with catalase (CAT)-labeled antibodies, which were synthesized using trans-cyclooctene / 1,2,4,5-tetrazine click chemistry reaction, resulting in the forming of enzymatic bacteria. Then the CATs on the enzymatic bacteria were used to decompose an excessive amount of hydrogen peroxide (H 2 O 2 ), the remaining H 2 O 2 was mixed with horseradish peroxidase to etch the GNRs, resulting in color change and absorbance peak shift of the GNRs. Finally, the peak shift was measured and analyzed for the quantitative determination of target bacteria. This immunosensor was able to detect Salmonella Typhimurium with a linear range of 10 1 –10 5 CFU mL −1 in 3 h with a low detection limit of 35 CFU mL −1 . The mean recovery for Salmonella Typhimurium in spiked chicken samples was 109%.
Schematic representation of a colorimetric immunosensor for the determination of Salmonella Typhimurium as low as 35 CFU mL −1 using rotating magnetic separation of Salmonella from a large-volume sample, click chemistry reaction of catalase with antibodies for signal amplification, and HRP-mediated gold nanorod etching for result indication.
研究领域:
食品科学
·
分析化学
·
纳米技术
·
微生物学
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产品关联
DOI
PubMed
高影响因子
危险品化学品经营许可证（带存储）