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Advanced Optical Materials · 2016 ·Vol. 4 ·期 5 ·722-730 · IF 5.359

In Situ Surface Assembly Derived Ultralow Refractive Index MgF2–SiO2 Hybrid Film for Tri-Layer Broadband Antireflective Coating

Xinmin Cui,Ruimin Ding,Mengchao Wang,Cong Zhang,Ce Zhang,Jing Zhang,Yao Xu

For the broadband antireflective (AR) coating working in specific wavelengths, the precise control over refractive index and film thickness of each layer is critical to guarantee the peak position locating at the targeted wavelengths. In this paper, a simple sol–gel procedure without post-treatment is used to prepare MgF 2 –SiO 2 hybrid coating with tunable refractive index for the fabrication of tri-layer tri-wavelength broadband AR coating. The MgF 2 –SiO 2 coating with ultralow refractive index of 1.12 is realized through in situ surface assembly of negatively charged silanol groups on vesicle-like MgF 2 particles to obtain porous crosslinking structure. The electrostatic attraction between the negatively charged silanol groups and positively charged MgF 2 colloidal particles plays a key role. Furthermore, the MgF 2 –SiO 2 coating with a wide range of refractive index between 1.20 and 1.44 is achieved by adjusting the addition amount of acid-catalyzed silica sol into the vesicle-like MgF 2 sol. According to the theoretical design, a tri-layer broadband AR coating with refractive index model of 1.12/1.26/1.36 is prepared, which can enhance the transmittance of quartz substrate to near 100% simultaneously at 351, 527, and 1053 nm.

研究领域: 材料科学 · 光学工程
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Coatings · 2023 ·Vol. 13 ·期 5 ·811 · IF 3.4

Fabrication of a Composite Film Optic with High Transmittance in Vis and IR Regions for an Optical System

Jiajia Yin,Bin Fan,Junfeng Du,Hu Yang,Jiang Bian

In this study, a lightweight composite polyimide film optic with antireflective coating was prepared using an ion-beam-assisted reactive sputtering method. It exhibited high transmittance in visible (87%, 0.5~0.8 μm), short (86%, 1.8~2.7 μm) and middle (78%, 3.3~5.4 μm) wavelength infrared regions. Additionally, it also showed great optical homogeneity (0.006 λ in RMS and 0.034 λ in PV, λ = 632.8 nm) with smooth surfaces (RMS = 0.786 nm). The thermal stability of the polyimide film was also effectively maintained after the antireflective coating. At the same time, by utilizing the hydrophobic properties of coating materials (Ta2O5/SiO2), the antireflective layer acted as an effective water barrier on the film surface to reduce the water absorption.Keywords:composite polyimide film;Ta2O5/SiO2antireflective coating;high transmittance;visible;infrared

CAS / MDL: 872-50-4
研究领域: 光学材料 · 薄膜技术
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Surfaces and Interfaces · 2021 · IF 4.837

Design and preparation of superhydrophobic, broadband and double-layer antireflective coatings

Xiaoyu Sun,Kai Hu,Jielei Tu,Ketong Chen

As one of the most widely used optical films , antireflective coating (ARC) is widely used in lasers, display screens and solar cells. In this article, the double-layer ARC coating consists of a bottom layer using SiO 2 -TiO 2 composite nanomaterials and a top layer of SiO 2 modified with Hexamethyldisilazane (HMDS). The optimal parameters of the double-layer ARC were obtained through the simulation software Macleod. Meanwhile, the aging time of SiO 2 sol, the volume fraction of HMDS, the annealing temperature, the dip-coating speed, and the volume fraction of TiO 2 , which affect the refractive index of the bottom and top layers, were explored in order to match the best parameters. By adjusting the structure of the bottom and top layers, the double-layer broadband ARC coating has a maximum transmittance of 97.6% in the 400-1800 nm spectral range , and an average transmittance of 96.0%. In addition, HMDS was used to modify the SiO 2 sol to obtain a double-layer ARC with superhydrophobic properties with a hydrophobic angle of 151.4°. After the high-temperature and high-humidity environment test, the antireflective performance of the double-layer ARC has not changed significantly, demonstrating the broad prospects for application in large outdoor solar photovoltaic power plants. Moreover, this work not only provides a new method for adjusting the refractive index of the coating, but also opens up a new way for the preparation of broadband ARC.

研究领域: 材料科学 · 光学工程
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International Journal of Nanoscience · 2023 · IF 0.8

Facile Fabrication of Graded-Refractive-Index SiO2 Antireflective Films with Enhanced Laser Damage Resistance

Jie Yang,Jun Li,Zhantao Wei,Tao Wang,Hang Jiang,Likang Xiao,Jianghe Lan,Jiayi Zhu,Xiaoru Liu,Gang Xu,Zhipeng Gao,Zhengwei Xiong

The graded-refractive-index SiO 2 antireflective (AR) films were prepared using the sol–gel method. A monolayer with a porous nanonetwork structure was designed as the mixed volume ratio of 70:30 between the alkali- and acid-catalyzed SiO 2 sols. As the top layer, the hexamethylisilazane (HMDS) modified alkali catalyzed SiO 2 sols induced SiO 2 nanoparticles transforming from hydrophilic to hydrophobic nature. In comparison with the structures of monolayer and bilayer films, the AR properties and laser damage resistance were investigated in detail. By designing the nanostructures of the bottom and top layers, the graded- refractive-index SiO 2 film was obtained, consequently enhancing the AR performance. In the bilayer film, the transmittance reached ∼ 98%@532 nm and 97%@1064 nm, respectively, corresponding to the obvious reduction of reflectivity. The assembly of the bilayer SiO 2 film increased the laser-induced damage threshold by ∼ 30% from 25.3 J/cm 2 (monolayer) to 33.1 J/cm 2 (bilayer). The inducement of laser damage was further revealed by the analysis of morphological changes induced by laser damage, attributing to the initiator absorption of environmental contaminations. Therefore, the SiO 2 film not only provided a graded-refractive-index structure with good AR performance, but also had high laser damage resistance. The unique graded-refractive-index structure of SiO 2 AR films offers a new strategy for improving the performance of optical components in high-power laser systems.

研究领域: 光学材料 · 薄膜技术 · 光子学 · 应用物理 · 材料科学
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OPTICAL MATERIALS · 2025 · IF 4.2

Degradation mechanism of hydrophobicity in gamma-irradiated Sol-Gel silica films

Lijie Sun,Jianlei Guo,Bo Li

In laser-driven inertial confinement fusion (ICF) facities, sol-gel derived silica antireflective films have been widely prepared on optical components to improve the laser transmission performance. Current researches indicate that long-term exposure of final optical assemblies in high-power laser systems can lead to the degradation of anti-pollution performance, directly affecting the high-flux output of the laser facities. However, the underlying mechanisms remain unclear. Therefore, we conducted a multiscale investigation combining macroscopic wettability analysis with nanoscale structural characterization. Contact angle measurements demonstrated a systematic hydrophilicity shift ( Δ θ > 50 ° ) accompanied by a 139 % increase in surface free energy following gamma irradiation. High-resolution surface metrology via white light interferometry (WLI) confirmed roughness stability across irradiation doses up to 1000 kGy , while scanning electron microscopy (SEM) imaging revealed stochastic crack formation. Crucially, controlled experiments on geometrically ideal substrates established that such nanoscale topographical defects contribute minimally to wettability alterations, decisively shifting focus to chemical modification mechanisms. X-ray photoelectron spectroscopy (XPS) analysis revealed a notable decrease in relative carbon content from 18.96 % to 14.85 % as radiation dose increased from 0 kGy to 1000 kGy . Combined with the observation that hydrophobicity in non-irradiated samples primarily originates from surface-grafted hydrophobic groups (-CH 3 ), this confirms radiation-induced degradation of hydrophobic moieties as the key mechanism driving the hydrophobic-to-hydrophilic transition. This work elucidates the physicochemical mechanisms of surface contamination of the optical components in high-power laser systems, providing theoretical foundations for optimizing radiation resistance in antireflective films.

CAS / MDL: 999-97-3 78-10-4
研究领域: 材料科学 · 光学 · 核工程 · 表面化学 · 薄膜材料
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