Xiaojun Ruan,Jiangjiang Luo,Rui Wang,Yanbo Yao,Jingjiao Guan,Tao Liu
A nanometer-thick carbon film with a highly ordered pattern structure is very useful in a variety of applications. However, its large-scale, high-throughput, and low-cost fabrication is still a great challenge. Herein, microcontact printing (µCP) and direct laser writing carbonization (DLWc) are combined to develop a novel method that enables ease of fabrication of nanometer-thick and regularly patterned carbon disk arrays (CDAs) and holey carbon films (HCFs) from a pyromellitic dianhydride-oxydianiline-based polyamic acid (PAA) solution. The effect of PAA concentration and pillar lattice structure of the polydimethyl siloxane stamp are systematically studied for their influence on the geometrical parameter, surface morphology, and chemical structure of the finally achieved CDAs and HCFs. Within the PAA concentration being investigated, the averaged thickness of CDAs and HCFs can be tailored in a range from a few tens to a few hundred of nanometers. The µCP+DLWc-enabled electrically conductive CDAs and HCFs possess the characteristics of ease-of-fabrication, nanometer-thickness, highly regular and controlled patterns and structures, and the ability to form on both hard and soft substrates, which imparts usefulness in electronics, photonics, energy storage, catalysis, tissue engineering, as well as physical, chemical, and bio-sensing applications.
Boru Du,Jingyu Lu,Guantao Wang,Mingguang Han,Yan Gao,Sida Luo
Laser-induced graphene (LIG) is a highly promising technology for assembling thin-film electronics with miniaturized surficial patterns, although hard to guarantee both high-quality formation of raw materials and high resolution of feature size. In this study, a combined microcontact printing (μCP) and LIG protocol is creatively utilized to fabricate ultra-thin graphene films with highly ordered micro-stripe arrays. In addition to realize various patterned structures with unique scalable and stackable characteristics, PAA concentration (4–8 wt%) is systematically investigated as a critical parameter to precisely control the feature size of micro-patterns before and after the irradiation process, including line width (before: 5.37–22.44 μm, after: 4.83–22.32 μm) and average height (before: 69.81–187.39 nm, after: 5.72–48.61 nm). By further exploring a defocused multi-lasing strategy, sheet resistance of the graphene array could be optimized dramatically from 634.1 kΩ/sq to 1.9 kΩ/sq, while maintaining low ablation (45.38 % porosity) and high carbon content (84.2 wt%). Lastly, the process is demonstrated to assemble different graphene based electronic devices with miniaturized sizes, including liquid sensors with sensitivity of 2.7 % μL −1 and electrothermal heaters with temperature-ramping rate as high as 24.7 °C/s and working temperature as high as 248 °C.
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