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MATERIALS LETTERS · 2017 · IF 2.572

Preparation of super-hydrophobic antireflective films by rod-like MgF2 and SiO2 mixed sol

Zihan Ji,Lei Bao,Hongning Wang,Ruoyu Chen

Antireflective films with self-cleaning and abrasion-resistance properties show good performance in outdoor contaminated environments. In this paper, hollow rod-like MgF 2 sol was synthesized using the solvothermal method and 50   nm SiO 2 particle sol was prepared using the Stöber method. The SiO 2 -MgF 2 mixed sol was prepared by adjusting the zeta potential of the two sols, and then the SiO 2 -MgF 2 mixed films were coated on the glass using the dip-coating method. The maximum transmittance was 99.4% and the average transmittance was 97.5% in 400–800   nm wavelength regions. After the films were modified by n-hexadecyltrimethoxysilane (HDTMOS), the contact angle reached 150.2°, and the pencil hardness reached 4–5   H. In this way, the multi-functional antireflective films were endowed with significant practical value.

研究领域: 材料科学 · 光学工程
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OPTICAL MATERIALS · 2024 · IF 3.8

Porous SiO2 antireflection film with high UV resistance

Yonghong Wu,Zhihang Shang,Zhaorui Li,Wenle Zhu,Lifang Nie,Juncheng Liu

Sol-gel is one of the most economical methods to prepare antireflection films, but the low ultraviolet radiation-resistance (UV-resistance) of the sol-gel film limits its applicability in the solar industry. A SiO 2 antireflection film was prepared with sol-gel method with phenyl salicylate (PS) as the porogen. The effects of the PS addition were investigated on the microstructure, optical property and UV-resistance of the film. When the addition of PS is 1.20 g, the refractive index at 550 nm is 1.30, and the maximum transmittance is 96.30 %. The average transmittance within the 400–1100 nm range reaches its peak at 92.85 %, which is 4.35 percentage points higher than that of the blank glass. In addition, the film without PS has an average transmittance of 91.00 % after 5000 equivalent solar hours (ESHs) UV irradiation, decreasing 1.07 percent point, and has a pencil hardness of 5 H and an adhesion of grade 2 of the tape-tearing method. However, the film with 1.20 g of PS still has an average transmittance of 92.15 % after 5000 ESHs UV irradiation, decreasing only 0.7 percent point, and has a pencil hardness of 7 H and an adhesion of grade 1 of the tape-tearing method.

研究领域: 材料科学 · 光学工程
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Materials Today Chemistry · 2023 · IF 7.3

Facile preparation of porous SiO2 antireflection film with high transmittance and hardness via self-templating method for perovskite solar cells

M. Lu,Q. Liu,Z. Wang,X. Zhang,G. Luo,J. Lu,D. Zeng,X. Zhao,S. Tian

An antireflection (AR) film on the surface of the photovoltaic glass can significantly improve the photoelectric conversion efficiency of solar cells. However, AR films prepared by a facile and low-cost sol-gel method usually exhibit poor mechanical properties , which limits their applications. Herein, hexamethoxy methyl melamine resin (CYMEL 303LF) was employed as a pore-forming agent in the sol and sacrificial template to prepare porous SiO 2 film on glass by a facile sol-gel method and subsequent heat treatment. The obtained SiO 2 film showed a high solar transmittance increase of 3.24% in the wavelength range of 380–1100 nm and a good hardness of H when the dosage of CYMEL 303LF is 10 wt%, the short circuit current density and photoelectric conversion efficiency of the solar cell are increased respectively by 1.44 mA/cm 2 and 1.08%, compared with the substrate, which is better than most SiO 2 films in the previous works. With increasing the dosage of CYMEL 303LF from 0% to 12%, the solar transmittance gain was increased at first and then decreased, while the film hardness was decreased straightly. This was probably because that the introduction of CYMEL 303LF can facilitate the formation of more pores in the SiO 2 film, leading to a decrease in the refractive index and film adhesion. Therefore, this work can provide a facile method to prepare high-performance SiO 2 as AR film for solar cells.

研究领域: 材料科学 · 能源科学
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Journal of Inorganic and Organometallic Polymers and Materials · 2018 ·Vol. 29 ·期 1 ·72-79 · IF 1.754

Antireflection Films Based on Large-Area 2D Hollow SiO2 Spheres Monolayer Opals

Wang Jianfeng,Zhou Jianping,Adelihan Kuqitaer,Shen Fenglei,Li Hua

Hollow SiO 2 spheres are synthesized by using various sizes of PS spheres as sacrified templates followed removal of the PS core by calcination. Large-area 2D monolayer SiO 2 hollow spheres opals are fabricated through gas–liquid–solid interface self-assembly route base on core–shell PS@SiO 2 as structural bricks which is a simple, fast and easily large-area-fabricated. In this route, proper ratio of alcohol to water plays important role on the synthesis of core–shell PS@SiO 2 composite spheres while,the hydrophobic treatment of core–shell PS@SiO 2 composite spheres is found primarily to realize opal films floating on water surface and further to be compacted into well ordered large monolayer films. Scanning electron microscopy and transmission electron microscopy demonstrate the obtained hollow SiO 2 spheres opals are well dispersed and well-ordered into two dimensional arrays. ultraviolet–visible–near infrared (UV–vis–NIR) spectroscopy shows that transmission in visible light range increases with the added size of hollow SiO 2 spheres. In contrast to solid SiO 2 spheres opal, hollow SiO 2 spheres opals demonstrates their improved transmission due to their high porosity.

研究领域: 材料科学 · 纳米技术
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OPTICAL MATERIALS · 2024 · IF 3.8

Facile synthesis of anti-reflective silica film with both ultrahigh transmittance and self-cleaning function

Shuangquan Liu,Chen Weifeng,Yulong Qiao,Tao Li,Xu Li,Ting Xiao,Lihua Jiang,Xinyu Tan

Preparation of anti-reflective (AR) films with both high transmittance and self-cleaning function is crucial for the photovoltaic or other optical devices. Herein, the modified SO 2 AR film is fabricated through facile synthesis. For the synthesis of silica sol, the aging process is eliminated completely, thus greatly shortening the preparation time from days or weeks to hours. The obtained film possesses excellent transmittance, as high as 99.4% at 580 nm, increased by 8.5% for comparison with the original bare glass. After hydrophobic treatment, the water contact angle (WCA) of the film can achieve to about 140°, exhibiting the nice self-cleaning function. It is demonstrated that the hydrophobic modified film has outstanding thermal stability, chemical stability, and mechanical stability. This work contributes well to the synthesis of AR films with ultrahigh transmittance and excellent self-cleaning function, exhibiting the great significance in the development of AR films.

CAS / MDL: 2487-90-3
研究领域: 材料科学 · 光学 · 纳米技术 · 表面化学
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