Materials
·
2023
·Vol. 16
·期 19
·6612
·
IF 3.4
Bo Li,Lei Fan,Jie Bai,Jinhang He,Jianfeng Su,Song Wang,Chao Deng,Shifeng Liu,Zhiqing Zhang
Porosity is closely related to the corrosion and wear properties of a coating processed by thermal-spraying technology, and the quantitative characterization of porosity is a crucial part of the research on coating structures. The current image analysis method often uses the mechanical polishing method recommended by ISO to measure a coating porosity. This method has been proved to be an effective method for the characterization of oxide coatings. However, due to the significant differences in the physical and chemical properties between aluminum and oxides, this method may not be suitable for aluminum coatings, and a more appropriate approach needs to be explored. In this paper, the effects of three polishing technologies (mechanical polishing, argon-ion-beam polishing, and electrolytic polishing) on the porosity measurement of pure aluminum coatings were compared and studied. The research results showed that the commonly used mechanical polishing method and more advanced argon-ion-beam polishing method could not completely reveal the pore structure because SiC particles would be embedded in the pure aluminum coatings during mechanical polishing, filling large pores. Although electrolytic polishing technology had advantages in revealing the macroporous structure, it would introduce a microporous structure and oxides, which would affect the measurement of the coating porosity. The composite polishing technology (electrolytic polishing + argon-ion-beam polishing) could perfectly reveal the pore structure in the pure-aluminum coating, and the porosity of arc-sprayed aluminum coating was 9.9%, which was close to the macroscopic true value measured using the weighing method of 10.2%.Keywords:coating;mechanical polishing;argon ion beam;electrolytic polishing;porosity
研究领域:
材料科学
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表面工程
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产品关联
DOI
PubMed
高影响因子
ECS Journal of Solid State Science and Technology
·
2024
·Vol. 13
·期 8
·084007
·
IF 1.8
Lianfeng Hu,Yingjie Wang,Qiancheng Sun,Chun-Feng Hu,Haijun Cheng,Xin-Ping Qu
The impact of ceria abrasives on the chemical mechanical polishing (CMP) of molybdenum (Mo) films was examined in alkaline slurries utilizing H2O2 as an oxidizer and ceria abrasives. The static etching rate (SER) decreased after the addition of ceria abrasives to the alkaline H2O2-based slurry, while the removal rate (RR) increased except for that of the slurry at pH 9. At pH 9, following the etching of the Mo film in an H2O2 solution with ceria, the surface became coated with MoO3 and Ce2Mo4O15 species. These species originated from the interaction between ceria, H2O2, and molybdic acid. The Ce2Mo4O15 particles envelop the MoO3 surface, thereby preventing the etching of loose MoO3 and hindering further oxidation of Mo to MoO3. This process effectively reduces the RR of Mo. Utilizing ceria slurries at appropriate pH values facilitates achieving a smooth surface with a reasonable RR.
研究领域:
材料科学
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化学工程
✓ 已验证
产品关联
DOI
高影响因子
Waste and Biomass Valorization
·
2025
·
IF 2.8
Zhu Xiaoxiao,Jiang Xuesong,Ding Juxuan,Mo Zhangchao,Wang Ling,Ban Boyuan,Chen Jian
The growing market demand for glass polishing leads to the production of a significant amount of waste known as rare earth polishing powder waste (REPPW), which poses environmental risks. This study is expected to achieve the waste treatment and comprehensive utilization of rare earth resources. A simple direct and low-cost gravity settling-hydrofluoric acid (HF) leaching process is proposed to regenerate rare earth polishing powder from the glass polishing waste. Firstly, dilute and stir the waste slurry evenly before letting it stand. The next gravity settling step removes most of the large impurity particles, and the acid-leaching process restores the aggregated polishing powder particles to their original size while removing the SiO 2 impurities to obtain the regenerated polishing powder. The optimal conditions for the HF leaching process are 0.25 M, 10 min, and 25 °C. The powder regenerated reaches a rare earth content of 95.3% and can be directly used for glass polishing. Particularly, ultra-precision surface roughness is achieved and the materials removal rate reaches 119.4% of the pristine polishing powder. The regeneration mechanism of the HF leaching process is proposed. The material flow and mass balance of the products obtained during the regenerating process indicate that the recycling of 1000 kg REPPW slurry yielded approximately 658 kg regenerated polishing powder, and it provides a total economic value of 2438.7 US dollars in the regenerating process.
研究领域:
环境科学
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材料科学
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化学工程
✓ 已验证
产品关联
DOI
高影响因子
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
·
2024
·
IF 6.7
Cheng Qian,Yebing Tian,Shadab Ahmad,Zhen Ma,Ling Li,Zenghua Fan
The magnetorheological shear thickening polishing method, with its dual-stimulus response of shear thickening and magnetization enhancement, has emerged as a promising magnetic field-assisted polishing technology. However, in existing theories and experimental studies on polishing forces, the phenomenon of magnetization enhancement was mainly considered. The shear thickening effect has not yet to be incorporated into. Furthermore, there have been few systematic investigations on the polishing mechanism considering variations of force characteristics. The study aims to fill in these research gaps by developing theoretical models for both normal and tangential forces , and revealing the microscopic polishing mechanism during the magnetorheological shear thickening polishing process. Both normal and tangential polishing force models were established through taking the rheological properties of polishing media under magnetic field and plastic indentation theory into account. Polishing force measurement experiments under a multi-pole coupling magnetic field were conducted to reveal the variations of the polishing forces with different polishing parameters and to validate the established models. Furthermore, the microstructural evolutions of the polishing media components and the surface morphologies after polishing were combined with in-depth analysis to elucidate the polishing mechanism. The polished surface quality was significantly improved without visible scratches. The surface roughness of 48 nm was achieved from the initial value of 245 nm under the normal force of 3.36 N and the tangential force of 2.42 N. The study provides deep insights into the polishing forces characteristics and the polishing mechanism, which contributes to a theoretical guidance for optimizing polishing parameters and improving polishing quality.
研究领域:
材料科学
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机械工程
✓ 已验证
DOI
高影响因子
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
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2025
·
IF 3
Yebing Tian,Cheng Qian,Xiangyu Yuan,Kunal Arora,Guangyi Wu,Zepeng Chen,Qi Wang
Magnetorheological shear thickening polishing (MRSTP) has garnered significant attention in the field of ultra-precision polishing. However, current studies have primarily concentrated on the rheological properties of MRSTP fluids (MRSTPFs) and their application in polishing planar workpieces. The study investigated the sedimentation behavior, magnetization property of MRSTPFs, and their polishing performance on ring-shaped silicon carbide ceramic. The MRSTPFs were prepared by blending diamond particles, carbonyl iron particles, and a carrier fluid consisting of polyethylene glycol 200 and silicon dioxide. MRSTPFs with higher concentration of carrier fluid exhibited superior resistance to sedimentation. Specifically, the MRSTPFs with carrier fluid concentrations of 15 % and 20 % showed sedimentation ratios of 4 % and 2 %, respectively, after 49 days. The magnetic hysteresis loop of MRSTPFs revealed excellent magnetic stability and minimal hysteresis loss. The coercive force, remanence, and saturation magnetization were 6 Oe, 0.16 emu/g, and 43 emu/g, respectively. Furthermore, polishing experiments were conducted on ring-shaped silicon carbide ceramic using various polishing parameters, including feed rate, tool rotation speed, diamond particle size, and working gap. Under the optimal polishing parameters, the surface roughness was significantly reduced from 767 nm to 37 nm, indicating a remarkable improvement in surface quality. This study provides valuable insights into the fundamental characteristics of the MRSTPFs and highlights their significant potential for applications in ultra-precision polishing.
研究领域:
材料科学
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机械工程
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表面工程
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流变学
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磁性材料
✓ 已验证
产品关联
DOI
高影响因子
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
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2015
·
IF 1.517
Yang Chen,Zhina Li,Cheng Qian
To improve the structural stability of the core–shell organic–inorganic composite abrasives during chemical mechanical polishing (CMP) processes, the polystyrene (PS) coated silica composites with homogeneous shells (amorphous silica networks, 15–20 nm in thickness) were synthesized via the sol–gel process of tetraethoxysilane at acidic aqueous condition in the presence of PS colloids (210–540 nm). Transmission electron microscopy and scanning electron microscopy were applied to characterize the as-synthesized samples. The effects of particle sizes and polishing pressures on oxide CMP performance were explored by atomic force microscopy. The results indicated that the obtained composite abrasives exhibited excellent polishing performance and structural stability during polishing processes. With the increase of the polishing pressures (13.8–41.4 kPa), the layer removal rate (RR) increased correspondingly, while the root-mean-square (RMS) roughness of polished substrates decreased firstly and then increased. Moreover, the RR and RMS for the composite abrasives increased with the increase of PS core sizes. At a given polishing pressure of 27.6 kPa, the highest RR (82.5 ± 7 nm/min) was obtained for the PS coated silica composites with largest cores (ca. 540 nm), while the lowest RMS roughness (0.189 ± 0.02 nm) was observed for the composites with smallest cores (ca. 210 nm). Furthermore, the polishing results in our CMP experiments were rationalized according to the indentation-based material removal mechanism (Chen et al. Appl Surf Sci 2012; 258:8469–74).
研究领域:
材料科学
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表面工程
✓ 已验证
产品关联
DOI
高影响因子
APPLIED SURFACE SCIENCE
·
2017
·
IF 3.387
Tingting Liu,Hong Lei
Abrasive is one of the most important factors in chemical mechanical polishing (CMP). In order to improve the polishing qualities of sapphire substrates, the novel Nd 3+ -doped colloidal SiO 2 composite abrasives were prepared by seed-induced growth method. In this work, there were a series of condensation reactions during the synthesis process of Nd 3+ -doped colloidal SiO 2 composite abrasives and the silica cores were coated by shells (which contains SiO 2 , Nd 2 Si 2 O 7 and Nd(OH) 3 ) via chemical bonds and hydrogen bonds in the Nd 3+ -doped colloidal SiO 2 composite abrasives, which made the composite abrasives’ core-shell structure more sTable Scanning electron microscopy (SEM) showed that Nd 3+ -doped colloidal SiO 2 composite abrasives were spherical and uniform in size. And the acting mechanisms of Nd 3+ -doped colloidal SiO 2 composite abrasives on sapphire in CMP were investigated. Time-of-flight secondary ion mass spectroscopy (TOF-SIMS) analysis and X-ray photoelectron spectroscopy (XPS) analysis demonstrated that the solid-state chemical reactions between the shells (which contained SiO 2 , Nd 2 Si 2 O 7 and Nd(OH) 3 ) of Nd 3+ -doped colloidal SiO 2 composite abrasives and the sapphire occurred during the CMP process. Furthermore, Nd 3+ -doped colloidal SiO 2 composite abrasives exhibited lower surface roughness and higher material removal rate (MRR) than the pure colloidal SiO 2 abrasives in the same polishing conditions, which was attributed to the solid-state chemical reactions between shells of Nd 3+ -doped colloidal SiO 2 composite abrasives and sapphire.
研究领域:
材料科学
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表面工程
✓ 已验证
产品关联
DOI
高影响因子
CERAMICS INTERNATIONAL
·
2022
·
IF 5.532
Zhiguang Sun,Yebing Tian,Zenghua Fan,Cheng Qian,Zhen Ma,Ling Li,Honglin Yu,Jiang Guo
Zirconia ceramic components have great applications in the fields of medical, aerospace, and energy. Stereolithographic (SLA) 3D printing technology is widely employed for zirconia ceramic fabrication. However, the surface quality of manufactured components by direct SLA 3D printing is hard to meet stringent requirements of industrial application. In this work, an enhanced alternating-magnetic field-assisted finishing (A-MFAF) method was proposed for SLA printed zirconia ceramics. The A-MFAF was achieved using a flexible alternating-magnetic-field generator, integrating a rectangular magnetic pole and radial magnetic column. The novel finishing tool was fabricated to regulate finishing media behaviors for ensuring desirable finishing force. The unique construction of the magnetic field generator provided a controllable alternating magnetic field in the finishing zone. The magnetic control characteristics were investigated with finite element analysis (FEA). A serial of finishing experiments were carried out to verify the feasibility of the proposed A-MFAF method for SLA printed zirconia ceramics. The finishing efficiency with the developed magnetorheological shear thickening finishing (MSTF) media was improved by over 24% compared to that with the conventional magnetorheological finishing (MRF) fluids. The variation of surface roughness was qualitatively evaluated under different finishing conditions. The surface roughness of 89 nm was obtained from the initial 1.79 μm at 0.6 mm working gap and 700 r/min spindle rotational speed. Digital microscope, optical profiler and surface hydrophobicity measuring instrument were employed to investigate the surface characteristics of the finished SLA printed zirconia ceramics. Ultra-smooth surface with slight defects and deformations was obtained. The feasibility of A-MFAF method for the ultra-precision finishing of SLA printed zirconia ceramics was verified.
研究领域:
材料科学
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机械工程
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精密加工技术
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产品关联
DOI
高影响因子
Micro & Nano Letters
·
2019
·Vol. 14
·期 13
·1328-1333
·
IF 0.975
Yue Dong,Hong Lei,Wenqing Liu
Abrasives directly affect the polishing rate and surface quality for sapphire chemical mechanical polishing (CMP). In this work, irregular silica nano-abrasives were synthesised by nickel ion-induced effect combined with growth method in order to simultaneously acquire a high polishing rate and a smooth and flat surface quality on sapphire. The synthesis process of irregular silica nano-abrasives is predicted and analysed by zeta potential. The irregular silica nano-abrasives have a distinguished CMP behaviour for a 22.72% increase in polishing rate and a flat surface quality of sapphire. X-ray photoelectron spectroscopy analysis results have confirmed these solid-phase chemical reactions happen during the sapphire CMP process. In addition, it was analysed about the polishing process and mechanism by establishing a contact model between nano-abrasives and sapphire.
研究领域:
材料科学
·
化学工程
✓ 已验证
产品关联
DOI
高影响因子
Journal of Manufacturing Processes
·
2024
·
IF 6.1
Xiangxiang Cui,Zhenyu Zhang,Chunjing Shi,Qibo Peng,Xiaoyu Liu,Xiuqing Liu,Hongxiu Zhou,Junyuan Feng,Wei Wen
Aspheric thin-walled crucibles with large diameters are widely used for photovoltaics and semiconductor industries, while they have hard-brittle and aspheric characteristics. Nevertheless, these crucibles strictly require atomic surfaces and high material removal rate (MRR). This is a challenge for chemical mechanical polishing (CMP). To break this challenge, a novel green CMP was developed for fused silica, containing ceria, lanthana, hydrogen peroxide, diethylene triaminepentaacetic acid pentasodium, carboxymethyl cellulose sodium and guanidine carbonate. After CMP, surface roughness Ra of 0.115 is obtained at a scanning area of 5 × 5 μm 2 measured by atomic force microscopy, and MRR is 563 nm/min. In such an atomic surface, the MRR is the highest compared with those published previously. Transmission electron microscopy confirms that the thickness of damaged layer after CMP is only 2.63 nm. A novel approach of robot floating polishing is proposed for aspheric crucibles with a diameter of 810 mm and a height of 580 mm. Using the developed CMP, surface roughness Sa of 0.178 nm on inner surface of an aspheric thin-walled crucible is achieved under a measurement area of 50 × 50 μm 2 . X-ray photoelectron spectroscopy (XPS) and electron paramagnetic resonance reveal that the content of Ce 3+ increased from 28.54 to 43.76 %. Through Raman, XPS and Fourier transform infrared spectroscopy, CMP mechanisms are elucidated. Densified damaged layer on the surface of fused silica was induced by the transformation of surface structure from six-membered to four- or three-membered network. Ce-OH and Si-OH were formed between fused silica and ceria abrasives, forming Ce-O-Si by condensation reaction of dehydration. The developed green CMP and approach provide new pathway to polish and manufacture atomic surfaces for aspheric thin-walled crucibles with large diameters.
研究领域:
材料科学
·
表面工程
✓ 已验证
产品关联
DOI
高影响因子
Polymers
·
2023
·Vol. 15
·期 2
·317
·
IF 5
Yi Zhang,Tao Ge,Yifan Li,Jinlin Lu,Hao Du,Ling Yan,Hong Tan,Jiehua Li,Yansheng Yin
Biofilms are known to be difficult to eradicate and control, complicating human infections and marine biofouling. In this study, self-polishing and anti-fouling waterborne polyurethane coatings synthesized from gemini quaternary ammonium salts (GQAS), polyethylene glycol (PEG), and polycaprolactone diol (PCL) demonstrate excellent antibiofilm efficacy. Their anti-fouling and anti-biofilm performance was confirmed by a culture-based method in broth media, with the biofilm formation factor against Gram-positive (S. aureus) and Gram-negative bacterial strains (E. coli) for 2 days. The results indicate that polyurethane coatings have excellent anti-biofilm activity when the content of GQAS reached 8.5 wt% againstS. aureus, and 15.8 wt% againstE. coli. The resulting waterborne polyurethane coatings demonstrate both hydrolytic and enzymatic degradation, and the surface erosion enzymatic degradation mechanism enables them with good self-polishing capability. The extracts cyto-toxicity of these polyurethane coatings and degradation liquids was also systematically studied; they could be degraded to non-toxic or low toxic compositions. This study shows the possibility to achieve potent self-polishing and anti-biofilm efficacy by integrating antibacterial GQAS, PEG, and PCL into waterborne polyurethane coatings.Keywords:anti-fouling;anti-biofilm;self-polishing;waterborne polyurethane
研究领域:
材料科学
·
微生物学
✓ 已验证
产品关联
DOI
PubMed
高影响因子
International Journal of Precision Engineering and Manufacturing
·
2022
·Vol. 23
·期 11
·1261-1274
·
IF 2.041
Gao Xingjun,Li Xiang,He Yan,Fan Lin,Tang Meiling
In order to solve the problems of low efficiency, pollution and large damage of existing polishing methods, the electrical enhanced photocatalysis polishing method for single-crystal silicon carbide was proposed in this paper. The recombination of electrons and holes was inhibited by the combined action of applied electric field and chemical trapping agent, so the efficiency of oxidation was improved, and the polishing of silicon carbide with high efficiency and low damage can be achieved. The effects of various parameters such as polishing pressure, polishing speed, polishing pad, abrasive particles and oxygenation of slurry on polishing effect were studied. 0.025 MPa of polishing pressure, 60 r/min of polishing speed, 5 wt% of SiO 2 abrasive particles and synthetic fiber polymer polishing pad can provide the higher MRR of 1.18 μm/h and the best surface quality (Ra = 0.348 nm). In addition, it has been proven that UV, optimized pH, types of photocatalysts, electron trapping agent and voltage are necessary factors for the slurry to exhibit strong oxidizing properties. The MRR is mainly determined by both mechanical action (introduced by abrasive particles) and chemical action (introduced by slurry). The above technology can basically meet the requirements of high-efficiency, ultra-smooth and low damage polishing of single-crystal silicon carbide.
研究领域:
材料科学
·
半导体制造
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表面工程
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化学工程
✓ 已验证
产品关联
DOI
高影响因子
危险品化学品经营许可证（带存储）