Comprehensive Summary Extreme ultraviolet (EUV) lithography is a key technology for sub-7 nm nodes semiconductor manufacturing but faces challenges due to low energy conversion efficiency and weak sensitivity of photoresists. Antimony (Sb)-based materials have attracted increasing attention for their high EUV absorption cross-section. Herein, through a fluorine modification strategy, we functionalized a Sb 2 -oxo cluster with tailored carboxylic acid ligands to achieve dual-tone photoresist control. Crucially, fluorinated ligands induced positive- tone patterning with enhanced sensitivity, while the non-fluorinated ligand decorated Sb 2 -oxo cluster maintained conventional negative-tone behavior. Combined X-ray photoelectron spectroscopy (XPS) analysis, UV-vis absorption spectroscopy analysis, and theoretical calculations highlight the potential of fluorine to alter the inherent cross-linking mechanisms. This work not only enriches the examples of metal oxo cluster based positive photoresists but also provides an effective approach to manipulating photoresist polarity at the molecular level.
Fengting Yao,Ziheng Li,Yan Dai,Xuehua Ruan,Xiaohang Yang,Xiaobin Jiang,Wenji Zheng,Gaohong He
Metal organic frameworks (MOFs)-based mixed matrix membranes (MMMs) exhibit great prospects for H 2 purification. However, their further development is hindered by interfacial incompatibility and framework flexibility-induced selectivity loss. Inspired by the “like compatible like” principle, a fluorinated engineering strategy is developed by introducing isoelectronic −CF 3 groups into ZIF-9 (FZIF-9), achieving dual regulation of MOF-polyimide (6FDA-TFMB) interfaces and molecular sieving architecture. The −CF 3 functionalization synergistically enhances interfacial compatibility through dipole interactions (C═O···F−C), optimizes pore size (3.67 Å) to achieve size-exclusive H 2 /CH 4 separation. Meanwhile, it suppresses the dissolution and adsorption of CH 4 molecules by reducing the CH 4 adsorption capacity on FZIF-9 by 40% compared with ZIF-9. The FZIF-9/PI-20 wt.% MMM exhibits excellent improvements of 22.1% and 133.1% in H 2 permeability (159 Barrer) and H 2 /CH 4 selectivity (295) over ZIF-9/PI-20 wt.% MMM. Importantly, its selectivity is superior to state-of-the-art MOFs/6FDA-based MMMs, approaching the 2015 Robeson upper bound. This work establishes fluorine-mediated interface engineering as a universal strategy for advanced gas-separation membranes, particularly in H 2 /CH 4 separation.
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