Removal of trace Na and K metal ions by resin-grafted crown ether for electronic-grade N-methyl pyrrolidone purification
The semiconductor industry’s rapid evolution necessitates ultra-high-purity N-methyl pyrrolidone (NMP) as an essential electronic-grade solvent. The development of an efficient coordination material to reduce trace metal ions, particularly Na and K metal ions, to below 1 ppb in NMP solution is a significant challenge. To address this, a novel coordination material, St-DVB-g-ACE, has been developed for the removal of Na and K metal ions from NMP. The material was synthesized by grafting 4′-aminobenzo-15-crown-5-ether onto a strong acid gel resin. The resulting St-DVB-g-ACE-3 exhibited excellent coordination performance for Na and K metal ions, with maximum Langmuir adsorption capacities reaching 20,000 μg/g and 33,333 μg/g, respectively. Of particular interest was the ability of St-DVB-g-ACE-3 to reduce all trace metal ions in industrial-grade NMP to below 1 ppb within a fixed bed column, achieving the stringent requirements for electronic-grade NMP at the G3 level. Additionally, the absorbent enhances the purity of NMP from 99.82 % to 99.84 %, indicating that the material is not dissolved and can exist stably in NMP. Its excellent recyclability and reproducibility make it highly practical for industrial use. Density functional theory (DFT) simulation, complemented by spectral analyses, revealed the interaction force and thermodynamic properties between Na and K metal ions and crown ether ring, and illustrated the interaction between anionic sulfonic group (−SO 3 − ) and metal ions. The prepared resin-grafted crown ether adsorbents are highly effective in the thorough removal of trace metal ions from NMP solution, offering a novel and effective method for the production of electronic-grade NMP.
危险品化学品经营许可证（带存储）