Journal of Water Process Engineering
·
2025
·
IF 6.7
Chen-Yan Hu,Li-Li Hu,Tian-Yang Zhang,Xin-Yu Yang,Hao Liu,Jia-Nan Chen,Ling-Mei Gao,Zheng-Yu Dong
Emerging contaminants (ECs) have received widespread attention. In this study, the Far-UVC (222 nm) combined with chlorine (UV 222 /chlorine) system is used to remove ECs from water. The results reveal that carbamazepine (CBZ) was effectively degraded by the UV 222 /chlorine system, with a degradation efficiency of 92.5 % within 45 min at a UV fluence of 666 mJ cm −2 and a chlorine concentration of 200 μM. Quenching experiments indicate that HO• and Cl• play a major role in the UV 222 /chlorine system. The steady-state concentrations of HO• (3.85 × 10 −14 M), Cl• (8.55 × 10 −14 M), and ClO• (9.13 × 10 −12 M) in the UV 222 /chlorine system is determined by using probe method. The degradation of CBZ by UV 222 /chlorine system (92.5 %) is significantly better than that of UV 222 alone (32.3 %) and the UV 254 /chlorine system (78.3 %) at the same UV dose. In addition, the UV 222 /chlorine system exhibits excellent EE/O performance of 0.53 KWh/L, effectively reducing resource consumption. Compared with the UV 222 /peracetic acid (PAA) system, the UV 222 /chlorine system shows higher degradation efficiency for CBZ in a wide pH range of 4 to 9. In addition, the presence of Cl − and HCO 3 − shows no significant impact on both the UV 222 /chlorine and UV 222 /PAA systems. The UV 222 /chlorine system is expected to become a promising alternative to traditional UV and chlorine disinfection techniques in water treatment . This study provides technical support for promoting the practical application of the UV 222 /chlorine system.
研究领域:
环境科学
·
水处理技术
✓ 已验证
产品关联
DOI
高影响因子
Inorganic Chemistry Frontiers
·
2025
·
IF 6.4
Xihui Shan,Yi Zhang,Xulong Lv,Yanjie Liang
Far ultraviolet-C (far-UVC; 200–230 nm) luminescent materials have garnered significant interest in recent years, driven by the growing demands for applications such as disinfection and solar-blind imaging due to their distinct wavelength features. However, the research and development of far-UVC persistent phosphors are lacking. Here, we report the realization of far-UVC persistent luminescence in CaSO4:Pr3+ and CaSO4:Pb2+ phosphors, which show emissions peaking at 220 nm and 230 nm with a long persistence time of >24 h after ceasing X-ray excitation. This is by far the shortest UVC afterglow emission to the best of our knowledge. The far-UVC afterglow from the charged phosphors can be readily detected by a solar-blind UV camera in both indoor-lighting and outdoor environments owing to the absence of background noise from ambient light. The continuous photostimulation of indoor white LED light and outdoor sunlight has different impact on the far-UVC afterglow performance of CaSO4:Pr3+ and CaSO4:Pb2+ phosphors, which is elucidated by the decay time-dependent thermoluminescence (TL) curves in different light conditions. This study expands the field of persistent luminescence to the far-UVC spectral region and will inspire the discovery of more excellent far-UVC persistent phosphors.
研究领域:
材料科学
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光学
✓ 已验证
产品关联
DOI
高影响因子
Nature Communications
·
2025
·Vol. 16
·期 1
·1-10
·
IF 15.7
Cai Chongyang,Li Leipeng,Lv Xiaohuan,Li Huimin,Li Tao,Li Pei,Zhao Wenting,Zi Lingzhu,Feng Shiji,Fan Xuan,Zhang Hailei,Peng Dengfeng,Wang Feng,Qiu Jianrong,Yang Yanmin
Lanthanides-doped luminescent materials have gathered considerable attention due to their application potential in stress sensing, lighting and display, anti-counterfeiting technology and so forth. However, existing materials mainly cover the 380–1540 nm range, with slight extension to the UV region, impeding their applications in solar-blind imaging, background-free tracking, concealed communication, etc. To address this challenge, here we propose guidelines for far-UVC (200–230 nm) optical design. Accordingly, we achieve multi-stimulated far-UVC luminescence at ~222 nm in Pr 3+ -doped SrF 2 , stemming from the inter-configurational 4f5d → 4f 2 transition of Pr 3+ . Besides Pr 3+ , the SrF 2 host shows high tolerance to Ce 3+ , Nd 3+ , Sm 3+ , Eu 2+,3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , Tm 3+ and Yb 3+ , vastly extending the emission wavelength across the entire spectral range from 200 to 1700 nm. Particularly, these materials exhibit self-recoverable mechanoluminescence by direct mechanical excitation, along with thermally and mechanically stimulated emission after X-ray irradiation. We demonstrate that these lanthanides-doped SrF 2 crystals offer unique opportunities for high-contrast marking and structural health monitoring in complex environments.
研究领域:
光学材料
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光电子学
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固体物理
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材料科学
✓ 已验证
产品关联
DOI
PubMed
高影响因子
JOURNAL OF HAZARDOUS MATERIALS
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2025
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IF 11.3
Youn-Jun Lee,Sung-Hyo Jung,Chang-Gu Lee
Low-molecular-weight organic pollutants present in feed water pose a significant challenge to maintaining ultrapure water (UPW) quality, as they are not readily removed by conventional treatment processes. Urea is a low-molecular-weight, nonionic, persistent organic pollutant resistant to conventional UPW production processes. Therefore, suitable oxidation technologies must be explored to convert urea to inorganic nitrogen ions, which are more easily removed in post-UPW treatment steps. In this study, the far-UVC (peak wavelength centered at 222 nm) coupled persulfate (PS) activation system was used for the effective oxidation of urea to nitrate (NO 3 − ). In the degradation of urea (10 μM, PS 0.4 mM, pH 7), far-UVC/PS systems (k urea,222/ PDS= 1.69 × 10 −3 cm 2 ∙mJ −1 , k urea,222/PMS = 2.69 ×10 −4 cm 2 ∙mJ −1 ) were found to be superior to conventional 254 nm LPUV/PS systems (k urea,254/PDS = 1.07 ×10 −4 cm 2 ∙mJ −1 , k urea,254/PMS = 7.01 ×10 −5 cm 2 ∙mJ −1 ). The far-UVC/PDS system showed the highest efficiency, achieving complete urea removal after 5241.0 mJ∙cm −2 of irradiation. The dominant role of SO 4 •− in urea degradation was systematically investigated, with urea removal showing a strong correlation with the steady-state concentration of SO 4 •− . Moreover, the evolution of inorganic nitrogen species and the reduction of total organic carbon were examined to assess the applicability of the system as a pretreatment technology in UPW production. The results provide valuable insights into the integration of the far-UVC process for the removal of low-molecular weight pollutants during UPW production.
研究领域:
环境工程
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水处理化学
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高级氧化技术
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分子生物学
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环境光化学
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水质净化
✓ 已验证
产品关联
DOI
PubMed
高影响因子
危险品化学品经营许可证（带存储）