Superhydrophobic surfaces have garnered significant attention for their wide-ranging applications in self-cleaning, anti-icing, and liquid manipulation. However, it remains a daunting challenge to precisely and rapidly fabricate superhydrophobic microstructures with the desired layout. In this study, Polydimethylsiloxane (PDMS) microstructures were replicated from a laser-structured glass mold fabricated by laser-induced deep etching (LIDE). The deep microholes/grooves with the desired layouts and geometrics were rapidly fabricated into the glass mold by picosecond laser modification followed by wet etching. The well-arranged high-aspect-ratio micropillars/wall arrays were achieved on a PDMS surface by a subsequent soft lithography process. The influences of the aspect ratio and spacing of the micropillars on the hydrophobicity and transparency of the PDMS surface were investigated. Both good superhydrophobicity and high transparency can be simultaneously achieved by the use of optimized micropillar geometrics. Transmittance loss due to the presence of the high-aspect-ratio micropillars can be less than 1% over the wavelength region measured (300–1100 nm). Furthermore, to enhance the durability and robustness of the micropillars, protective interconnected microwalls were demonstrated without compromising hydrophobicity and transparency. This research opens up the possibility of rapid manufacturing of superhydrophobic and transparent surfaces with flexible layouts of microstructures.
Block copolymer (BCP) films with perpendicularly aligned cylindrical domains of high aspect ratio have important applications in diverse fields. However, an aspect ratio of the cylinders as high as 200 has rarely been reported so far. Here we demonstrate an efficient route to the formation of normally aligned P4VP cylinders with high aspect ratio surrounded by a matrix of azobenzene-containing block (PMA(Az)) via hierarchical self-assembly. A crisscross structure, consisting of parallelly aligned liquid crystalline (LC) layers and normally aligned self-assembly domains, is expected to assist the formation of well-defined nanostructures. The LC layers in the cylindrical films self-assemble to form smectic phase after solvent annealing, as confirmed by WAXD and UV-vis spectra. We found that the aspect ratio of the vertical P4VP cylinders is up to 200 and the film thickness reaches 6 μm. P4VP is a functional polymer, making this P4VP-b-PMA(Az) film more suitable for advanced filters, multi-nanochannels, nanolithography, and high-density storage media, etc.
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