This study aimed to establish a rapid analytical method to determine antioxidants in essence. A simple, efficient and practical, vortex-assisted, cloud-point extraction (VACPE) procedure is proposed for extracting and pre-concentrating four different of synthetic phenolic antioxidants (SPAs), propyl gallate (PG), tert -butylhydroquinone (TBHQ), butylated hydroxyanisole (BHA), butylated hydroxytoluene (BHT) in essence prior to high performance liquid chromatography (HPLC) analysis. The non-ionic surfactant, fatty alcohol polyoxyethylene ether-9 (AEO-9), was used as extractant and vortex-mixing was utilized to reduce extraction time and improve extraction efficiency. The effective parameters of the extraction process, such as volume of extraction solvent, pH, vortex-mixing time, equilibration temperature and time, were optimized. Under the optimum conditions, the linear range of PG, TBHQ, BHA and BHT was 8.0–800 ng/mL. All correlation coefficients of the calibration curves were higher than 0.996 and relative standard deviations (RSD, n = 5) were 2.36%–5.46%. The proposed method was successfully applied to the extraction and determination of antioxidants in essence samples with satisfactory relative recoveries of 89.4%–103.5%. The results confirmed the SPAs of essence could be effectively monitored by this method and also established good reference criteria for essence.
To enhance silicon wafer surface quality and corrosion resistance during chemical mechanical polishing (CMP), this study develops a composite surfactant system combining nonionic AEO-9 and anionic ADBS. At an optimal AEO-9/ADBS molar ratio of 2:1, the formulation achieves low surface roughness (Ra = 0.135 \(nm\) ), a high material removal rate (MRR = 198 \(nm/min\) ), stable slurry dispersion, and peak corrosion inhibition efficiency of 93.3%. Synergistic effects at this ratio are confirmed by a negative interaction parameter ( \(\beta\) = − 1.90) and enhanced micellization. Adsorption between surfactant molecules and silicon wafer follows the Langmuir adsorption isotherm. Molecular dynamics simulations further reveal strong adsorption of surfactant molecules in a parallel orientation on the silicon surface, with a high binding energy of 337.2 \(kJ/mol\) , which improves wetting and water retention. This work presents a strategy integrating corrosion inhibition with surface quality optimization in CMP slurries, providing molecular-level insights into surfactant-assisted protection for designing high-efficiency, low-defect slurries for advanced wafer fabrication.