One-pot etching UiO-66-NH2 to format orientational deposition AgCl/Ag0 without illumination for high-efficiency photocatalytic removal of Diazinon
AgCl/Ag 0 shows great promise for the removal of environmental pollutants, while its photocatalytic performance is still a great challenge on account of the agglomeration. Herein, orientational deposited and octahedral AgCl/Ag 0 were obtained by etching the UiO-66-NH 2 template for the first time. The 0.35:1–AgCl/Ag 0 exhibited outstanding efficiency in the degradation of Diazinon (DZN), which was closely 300 times than that of UiO-66-NH 2 and 0.35:1–AgCl@Ag 0 prepared without a template. Its bigger surface area provided more active sites to promote mass transfer efficiency and large amounts of •OH and 1 O 2 were fabricated to offense specific positions of DZN determined through Fukui function. Meanwhile, a high removal rate of 91.0 % was obtained after 5 recycles. Finally, the results of HPLC-MS, T.E.S.T., TOC and IC indicated all intermediates had less toxicity than DZN and were rapidly mineralized. Our work developed a new strategy for designing superb performance AgCl/Ag 0 photocatalysts.
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