Sequential ClO2-UV/chlorine process for micropollutant removal and disinfection byproduct control
This study systematically revealed the feasibility of the sequential ClO 2 -UV/chlorine process for micropollutant removal and disinfection byproduct (DBP) control. The results demonstrated that the sequential ClO 2 -UV/chlorine process was effective for the removal of 12 micropollutants. ClO 2 pre-treatment reduced the formation of disinfect byproducts (DBPs) in the UV/chlorine process. Compared to the UV/chlorine process, ClO 2 pre-treatment (1.0 mg L −1 ) decreased the formation of the 6 DBPs by 25.1–72.2%; and decreased the formation potential of the 6 DBPs by 13.9–51.8%. Moreover, ClO 2 pre-treatment reduced the concentration of total organic chlorine by 19.8%. ClO 2 pre-treatment affected the UV/chlorine process in different ways. Firstly, ClO 2 pre-treatment generated chlorite, which dominantly served as a scavenger of chlorine radical (Cl ) and hydroxyl radical (HO ). Secondly, ClO 2 pre-treatment decreased the reactivity of natural organic matter (NOM) towards radicals. Finally, ClO 2 pre-treatment altered the properties of NOM, in terms of reducing the electron-donating capacity and aromaticity of NOM (SUVA 254 ), and slightly reducing the average molecular weight of NOM. Overall, ClO 2 pre-treatment effectively controlled the formation of DBPs in the UV/chlorine process. This study confirmed the sequential ClO 2 -UV/chlorine process was an alternative strategy to balancing the micropollutant removal and DBP control.
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