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Ga2O3掺杂
CERAMICS INTERNATIONAL · 2020 · IF 3.83

Mechanism of Ga2O3 addition on the enhancement of electrical and mechanical properties of ZnO based varistor

Bo-wen Wang,Bao-hui Chen,Peng-zhao Gao,Hui-hui Chen,Pei Zhang

ZnO based varistors added with minor content of Bi 2 O 3 , Sb 2 O 3 , Co 2 O 3 , SiO 2 , MnO 2 et al. with high voltage gradient, excellent mechanical and thermal properties were fabricated by Ga 2 O 3 doping and using raw ZnO nanoparticles . The compositions and microstructure of the varistors, as well as their electrical, mechanical, and thermal properties were investigated via XRD , XPS, SEM, E-J, C–V, mechanical, and thermal expansion measurements. Also, the mechanism of Ga 2 O 3 addition on the electrical and mechanical properties of the varistors was discussed in detail. Results showed that the added Ga 2 O 3 preferentially occupied the lattice position of ZnO crystal through the formation of a substitutional solid solution (Donor doping), it then occupied the void position through the formation of an interstitial solid solution (Acceptor doping), in which the residual Ga 2 O 3 existed in the grain boundary and served as inversion boundaries. The formation of the substitutional and interstitial solid solutions helped to improve the electrical properties, when Ga 2 O 3 content was 0.40 mol%, values of E 1mA , α, and K were 1235.00 V mm −1 , 46.0, and 1.37, respectively, being due to the small particle size and the related content of donor, acceptor and grain boundary in ZnO grain; The increased content of inversion boundaries stimulated the abnormal growth of ZnO grain, and the formed plate-like grain helped to improve the mechanical properties and thermal expansion coefficient of the varistors, values of σ f , E f , and K IC could reach 147.43 MPa, 213.61 GPa and 2.05 MPa m 1/2 , showing improvements of 25.29%, 47.67%, and 38.51%, respectively, compared with those of ZnO based varistors without Ga 2 O 3 .

CAS / MDL: 12024-21-4 1314-13-2
研究领域: 材料科学 · 电子工程
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APPLIED SURFACE SCIENCE · 2024 · IF 6.3

Sub-5 nm ultrathin IGO film transistor printed by micro-doped InGa liquid alloy

Jiaming Guo,Jing Li,Shanhao Ze,Fei Li,Junchao Wang,Qing Liu,Zhe Hua,Liu Yang,Fei Liu,Baodan Liu

In this study, we introduce a novel perspective that the formation of the atomically ultrathin oxide layer on the surface of liquid alloys is primarily governed by thermodynamic laws and is additionally influenced by the surface tension of the liquid alloys. In this case, we control the competition of Gibbs free energy and surface tension to effectively address the severe segregation problem of Ga 2 O 3 and realize the precise doping of Ga 2 O 3 in the preparation process of two dimensional IGO film through the liquid InGa alloy printing approach. Importantly, the Ga 2 O 3 content in the IGO films can be tailored in the full range and a sub-5 nm ultrathin IGO film transistor is innovatively fabricated. The oxidation law, band gap, Fermi level, field-effect mobility, subthreshold swing, and other properties of IGO films in sub-5 nm scale are systemically investigated in detail. It has been demonstrated that the incorporation of Ga 2 O 3 in the doping process dramatically reduced the device's turn-off current and enhanced its ability to resist ultraviolet interference. This novel doping process opens up a significant opportunity for future developments of atomically ultrathin transparent conducting film.

CAS / MDL: 7440-55-3
研究领域: 材料科学 · 电子工程
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