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KCl共掺杂
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING · 2021 · IF 3.927

Adjustment of the band gap of co-doped KCl/NH4Cl/g-C3N4 for enhanced photocatalytic performance under visible light

Hongbing Song,Lei Liu,Haozhong Wang,Bingxiao Feng,Meng Xiao,Yubao Tang,Xiaofei Qu,Hengjun Gai,Tingting Huang

The development of a photocatalyst with high activity, large specific surface area and precise band gap adjustment is the focus of the field of photocatalysis in realizing energy conversion and improving environmental issues. In this paper, a simple synthesis process for co-doping of KCl and NH 4 Cl to precisely adjust the band gap of g-C 3 N 4 was developed. Various characterization results show that doping with KCl and NH 4 Cl can reduce the band gap of the carbon nitride , increase its visible light absorption, improve its carrier separation efficiency, thus showing good photocatalytic activity . Cl and K enter the g-C 3 N 4 layers via intercalation and form a dual-element charge transport channel between these layers, thereby facilitating the transport of electrons. The introduction of NH 4 Cl increases the specific surface area of the composite, thus providing abundant adsorption and reaction sites. The co-loaded photocatalyst CN-NH 4 Cl-0.05KCl was used to degrade rhodamine B (RhB) and tetracycline (TC) and showed excellent photocatalytic activity. A possible mechanism of photocatalytic degradation is proposed based on the analytic results.

CAS / MDL: 12125-02-9
研究领域: 材料科学 · 环境科学
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