Xiangfei Zheng,Changwei Ji,Jingcheng Liu,Ren Liu,Qidao Mu,Xiaoya Liu
Xanthate-mediated reversible addition–fragmentation chain transfer (RAFT) methodologies have been applicable to preparation of branched or star polymers. In this article, novel star copolymers have been synthesized through xanthate-mediated RAFT polymerization with p-acetoxystyrene and tert-butyl acrylate. Fourier transfer infrared, nuclear magnetic resonance spectra, and gas chromatography analyses indicated that the polymerization was successful between both of the monomers and the star RAFT agent. The intrinsic viscosity and Zimm branching factor (g′) were used to confirm the copolymers’ architecture. The ultraviolet absorbance of the copolymer solutions indicated that the copolymer was suitable for use as a krypton fluoride (KrF) laser photoresist. Moreover, the photolithography performance of the positive-tone chemically amplified photoresist was evaluated. The results indicated that the photosensitive based on the star copolymer was higher than the linear one, and the pattern resolution was around 200 nm at a low exposure energy.
A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence of sodium methoxide in methanol. The fourier transfer infrared (FT-IR) spectra and proton nuclear magnetic resonance ( 1 H–NMR) spectra indicated that the synthesis was successful. The molecular weight, glass transition temperature (T g ) and thermal decomposition temperature (T(10%)) of the copolymers increased with the addition of CA. Moreover, a positive-tone chemically amplified Krypton Fluoride (KrF) photoresist was prepared, and the photolithography performance of the photoresist was evaluated using a KrF laser exposure system, the result showed that the resolution could reach the level of 0.25 μm.
Yajun Xu,Jialong Zhang,Xiangfei Zheng,Liang Xu,Jingcheng Liu
The bottom anti-reflective coating (BARC) can enhance the resolution of nanopatterns in the lithography process. In this work, a series of copolymers P(GA- co -HPMA) containing anthracene group were synthesized using glycidyl methacrylate (GMA), hydroxypropyl methacrylate (HPMA) and 9-anthracene carboxylic acid (ACA) as monomer. The copolymers were characterized by fourier transform infrared (FTIR) spectroscopy, nuclear magnetic resonance ( 1 H NMR) spectroscopy, gel permeation chromatography (GPC), differential scanning calorimetry (DSC), thermogravimetric analysis (TGA) and ultraviolet absorption (UV–Vis). Next, bottom anti-reflective coatings (BARC) were prepared using P(GA- co -HPMA), p-toluenesulfonic acid (PTSA), highly methyletherified melamine (HMMM) and solvents. The influence of copolymers with different anthracene concentrations was studied on the properties of BARC, and the optimal BARC-4 exhibited commendably low surface roughness and excellent optical performance (n value and k value at 248 nm). At the first minimum film thickness, the reflectivity is reduced to nearly 0 %, making it suitable for use with KrF photoresist.
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