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One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

Tan Xianhua,Shi Tielin,Lin Jianbin,Sun Bo,Tang Zirong,Liao Guanglan

We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.