Environmental Technology & Innovation
·
2025
·
IF 7.1
Yanyan Liu,Bangxiao Zheng,Min Zhao,Feng Zheng,Xiaoqing Chen,Lei Wang
The effectiveness of ultraviolet advanced oxidation processes (UV-AOPs) was influenced by the prevalence of dissolved organic matter (DOM) in natural water bodies. This study investigated the impact of humic acid (HA), fulvic acid (FA), and extracellular organic matter (EOM) on the degradation of Ciprofloxacin (CIP) by UV 222 /Sodium Percarbonate (UV 222 /SPC) and UV 222 . The results demonstrated that all three types of DOMs suppressed CIP degradation in UV 222 /SPC, with EOM exhibiting stronger inhibitory effects than HA and FA. This suppression primarily arose from DOM's light-shielding properties and scavenging of hydroxyl radicals (•OH) and carbonate radicals (CO₃•⁻), which outweighed the compensatory effects of DOM-photosensitized reactive species. In contrast, EOM enhanced direct UV 222 photolysis of CIP due to its high absorption coefficient at 222 nm, which promoted the generation of excited triplet state EOM ( 3 EOM ⁎ ) and singlet oxygen ( 1 O 2 ) via photosensitization. These reactive species compensated for EOM’s light-shielding effect, enabling efficient indirect photodegradation of CIP. The organic matter in EOM rather than NO 3 - promoted the degradation of CIP in UV 222 . The fluorescence spectra and dissolved organic carbon (DOC) changes of DOM were analyzed in depth. In addition, both CO₃•⁻ and •OH contribute to CIP degradation in UV 222 /SPC, with the second-order rate constant of CO₃•⁻ with CIP measured at 4.79 × 10⁸ M⁻¹ s⁻¹. UV 222 /SPC showed lower energy consumption than UV 254 /SPC in treating the real water sample. This study deepens the understanding of the impact of DOM in UV 222 water purification.
研究领域:
环境科学
·
水处理工程
✓ 已验证
产品关联
DOI
高影响因子
Journal of Cleaner Production
·
2023
·
IF 11.1
Min Zhao,Ting Li,Yizhan Zhang,Jiaming Gan,Yiting Zhao,Xin Yu,Lei Wang
Advanced oxidation technology of KrCl excimer lamp activated H 2 O 2 (UV 222 /H 2 O 2 ) have been received widespread attention in the field of water treatment recently, due to the higher radical yield and environmentally friendly nature compared to UV 254 /H 2 O 2 . In this investigation, four representative parahalogenated phenols (HPs) degradation kinetic and mechanisms by UV 222 alone and UV 222 /H 2 O 2 were studied, respectively. The results showed that the photolysis rate constants ( k obs ) under UV 222 followed the order of p -Chlorophenol ( p -CP) > p -Fluorophenol ( p -FP) > p -Bromophenol ( p -BP) > p -Iodophenol ( p -IP), and the degradation rate constants ( k obs ) by UV 222 /H 2 O 2 followed the order of p -FP > p -CP > p -BP > p -IP. The molar absorption coefficient ( ε 2 22nm ) and quantum yield ( Φ 222nm ) of HPs photolysis were measured. Kinetic model simulating results are in fair agreement with the experimental results. Through HPLC-MS analysis and DFT calculation, the impact of halogen ions on the degradation kinetics of HPS by UV 222 and UV 222 /H 2 O 2 was found, the possible reaction pathways and mechanisms were proposed. Compared with UV 254 /H 2 O 2 for removing p -CP, UV 222 /H 2 O 2 was much more energy efficient.
研究领域:
环境科学
·
化学工程
✓ 已验证
产品关联
DOI
高影响因子
CHEMICAL ENGINEERING JOURNAL
·
2024
·
IF 13.3
Min Zhao,Yanyan Liu,Mingbao Feng,Xin Yu,Lei Wang
Advanced oxidation processes based on KrCl* excimer lamps (UV 222 -AOPs) have recently received widespread attention in water treatment due to their high radical yields. In this investigation, the degradation of two typical antibiotics, florfenicol (FLO) and ciprofloxacin (CIP), by UV 222 and its combination with hydrogen peroxide (H 2 O 2 ) or persulfate (PDS) were studied, respectively. The dual effects of inorganic anions on the degradation performance of UV 222 /UV 222 -AOPs were determined. It was found that NO 3 – significantly enhanced the photolysis of CIP, and the degradation rate constants increased from 1.03 × 10 -4 mJ −1 cm 2 (without NO 3 – ) to 2.56 × 10 -4 mJ −1 cm 2 (with 1 mM NO 3 – ). However, NO 3 – markedly inhibited the photolysis of FLO, leading to a decrease in the degradation rate constants from 1.18 × 10 -3 mJ −1 cm 2 (without NO 3 – ) to 5.27 × 10 -4 mJ −1 cm 2 (with 1 mM NO 3 – ). HCO 3 – was found to have a certain promoting effect on the photolysis of FLO and CIP, and SO 4 2- has a negligible effect on the photolysis of both antibiotics. The above three inorganic ions decelerated the degradation of CIP and FLO in UV 222 -AOP, where NO 3 – exerted the most inhibition. Through LC-MS analysis and ECOSAR model, the main transformation products were individually determined and evaluated for toxicity. In addition, the performance of UV 222 -AOPs and UV 254 -AOPs in reclaimed wastewater (RWW) treatment were compared, and the steady-state concentration of radicals was measured. This study provided novel insight into the application of UV 222 -AOPs in RWW treatment.
研究领域:
环境科学
·
水处理工程
✓ 已验证
产品关联
DOI
高影响因子
Journal of Water Process Engineering
·
2025
·
IF 6.7
Chen-Yan Hu,Jia-Nan Chen,Ling-Mei Gao,Xiao-Cong Ma,Ming Zheng,Xi-Wei Yang,Jia-Qi Yang,Tian-Hong Qiu,Hai-Qing Ding,Zheng-Yu Dong
The krypton chloride (KrCl*) excimer lamp (222 nm) has become a novel light source used in UV-based advanced oxidation processes (UV-AOPs). Recently, a large number of studies have explored the application of UV 222 /chlorine process in water treatment. However, the transformation patterns of widely present dissolved organic matter (DOM) in water in this process is still unknown, especially at the molecular level. This study investigated the removal, component changes, and potential mechanisms of DOM during UV 222 /chlorine process, with humic acid as a typical DOM. The results showed that the removal efficiency of DOC and UV 254 by UV 222 /chlorine process can reach up to 56.0 % and 69.8 %, significantly higher than that of UV 222 alone and chlorine alone. Electron paramagnetic resonance (EPR) experiments have confirmed that HO•, Cl• and 1 O 2 are the main active species in the reaction. The formation of disinfection by-products (DBPs) was detected. Compared to the UV 254 /chlorine process, the UV 222 /chlorine process can significantly reduce the formation of DBPs, mainly due to the higher removal rate of DBPs precursors. The molecular changes of DOM were analyzed using FT-ICR MS method. The active species generated in the system can cause multi-pathway transformation of phenolic compounds, while the conversion of aliphatic substances can undergo dealkylation reactions. This study provides valuable insights into the molecular transformation of DOM in the Far-UVC/chlorine process, which will help promote the application of Far-UV technology in water treatment.
✓ 已验证
产品关联
DOI
高影响因子
Journal of Environmental Chemical Engineering
·
2026
·
IF 7.5
Jia-Jing Lyu,Qing Bai,Qian-Yuan Wu,Yu-Jia Nong,Mu-Da Han,Min-Yong Lee,Zhong-Quan Ren,Jiang-Lei Xiong,Wen-Long Wang
Far-UVC at 222 nm (UV 222 ) is a promising alternative of conventional 254 nm (UV 254 ) lamps for microorganism inactivation and recalcitrant pollutant removal. This study evaluates UV 222 combined with chlorine (HOCl/OCl⁻) for removing 1H-benzotriazole (BTZ), a widely used UV-absorber and anticorrosion agent ubiquitously detected in wastewater, surface water, and swimming pools. UV 222 achieved 1.4−21.7 times faster direct photolysis of BTZ compared to UV 254 , attributed to higher quantum yield (3.0−32.4 enhancement). UV 222 /chlorine demonstrated strong synergies (factors of 3.7–16.3 across pH 5.0–10.0), consistently outperforming UV 254 /chlorine by 1.09–2.02-fold. Kinetic modeling revealed that UV 222 generates reactive radicals more efficiently, with innate quantum yields for HOCl and OCl⁻ photolysis being 1.7-fold and 4.0-fold higher than UV 254 , respectively, resulting in elevated steady-state concentrations of • OH, Cl • , and ClO • . Reactive chlorine species contributed 47.5%–72.9% to BTZ degradation. Notably, under alkaline conditions where OCl⁻ dominates, UV 222 /chlorine showed substantially greater advantage over UV 254 /chlorine, as UV 222 appears to mitigate the marked reduction in OCl⁻ efficiency. In complex water matrices, nitrate (≥0.5 mM) acted as a photosensitizer, enhancing BTZ removal, while humic acid caused moderate inhibition (16.8%−44.0%). In tap water and secondary effluent, UV 222 /chlorine achieved 1.39–3.86 times higher degradation than in deionized water, with nitrate-driven radical generation outweighing natural organic matter inhibition. Importantly, UV 222 /chlorine produced 23% lower chlorinated disinfection byproducts (DBPs) and 17% lower toxicity-index than UV 254 /chlorine, demonstrating its potential as an alternative of UV 254 -driven oxidation process.
✓ 已验证
DOI
高影响因子
WATER RESEARCH
·
2024
·
IF 11.4
Yu-Jia Nong,Qian-Yuan Wu,Yun-Peng Wu,Ju-Won Lee,Min-Yong Lee,Wen-Long Wang
The KrCl-excimer lamp, emitting far-UVC light at 222 nm (UV222), offers a promising alternative to conventional UVC light at 254 nm (UV254) for the photolysis of organic pollutants and the activation of radical sensitizers. This study was aimed to investigate the efficiencies of UV222 in the treatment of halogenated aromatics, focusing on its performance in degradation, dechlorination and detoxification. Chlorophenols, representative recalcitrant and toxic halogenated aromatics, were used as target pollutants. The pathways of direct photolysis, photooxidation and photoreduction under UV222 illumination were compared. UV222 outperformed UV254 in photolyzing chlorophenols (1.4−34.1 times faster), especially protonated chlorophenols, due to substantially higher UV absorption (17.1−108.0 times) and quantum yields (2.1−3.4 times). The quantum yields of chlorophenols were influenced by the inducive electron-withdrawing effect of Cl-substitutes. Moreover, UV222 improved the dechlorination of chlorophenols to 95 % compared to 60 % by UV254. The introduction of radical sensitizer (e.g., H 2 O 2 , nitrate, and sulfite) reduced 4-chlorophenol photolysis by competing for UV222 absorption, though the sensitizers partially increased radical oxidation via generating • OH or e aq − . UV222 photolysis of 4-chlorophenol increased the toxicity by 88.6 times through forming toxic intermediates (e.g., hydroquinone and resorcinol). Notably, • OH and e aq − (i.e., UV222/H 2 O 2 and UV222/sulfite) increased the dechlorination and • OH (i.e., UV222/H 2 O 2 ) detoxified the mixture solution. Moreover, UV222 photolysis remained effective for 4-chlorophenol removal in real paper-mill wastewater, indicating the potential application of KrCl* lamp UV222.
研究领域:
环境科学
·
化学工程
✓ 已验证
产品关联
DOI
PubMed
高影响因子
ENVIRONMENTAL SCIENCE & TECHNOLOGY
·
2025
·
IF 11.3
Yu-Jia Nong,Qian-Yuan Wu,Yuan-Chu Qin,Zi-Bo Jing,Er-Dong Wang,Qing Bai,Wen-Long Wang
UV/sulfite technologies offer promising advanced reduction processes (ARPs) for the degradation and dehalogenation of halogenated organic compounds (HOCs), but are limited by the low absorption of sulfite at a conventional wavelength of 254 nm (UV254). This study introduces a wavelength-optimized far-UVC KrCl* lamp (UV222)/sulfite as transformative ARPs. Sulfite exhibited 45.6-fold stronger absorption at 222 nm compared with 254 nm, coupled with a higher innate quantum yield (Φinnate) of 0.128 mol·Ein–1 versus 0.115 mol·Ein–1. This wavelength optimization generated 29.2-fold higher steady-state concentration of eaq–, with optimal performance at basic pH (>9) and moderate sulfite dosages (0.4–0.75 mM). HOC degradation and dehalogenation showed clear structure-dependent patterns. The enhancive effect of UV222 over UV254 negatively correlated with HOCs’ susceptibility to UV photolysis due to competitive absorption between sulfite and target compounds. Electron-withdrawing halogens significantly favored reductive degradation over oxidation, enabling UV222/sulfite to outperform UV222/H2O2 by 1.3–37.1 times in degradation and 1.9–48.6 times in dehalogenation efficiency, with prominent enhancement particularly for polyhalogenated HOCs. In real water matrices, nitrate and nitrite inhibited HOCs’ degradation through UV absorption and eaq– scavenging. Compared with UV254/sulfite, UV222/sulfite reduced energy costs by 92.7% and required lower sulfite doses. This study provides insights into the wavelength-matching mechanism for UV/sulfite, offering an economical and efficient solution for the remediation of recalcitrant HOCs.
研究领域:
环境科学
·
光化学
·
水处理
·
化学工程
·
污染修复
✓ 已验证
产品关联
DOI
PubMed
高影响因子
ACS ES&T Water
·
2024
·
IF 4.8
Jiawei Chen,Lin Du,Jian Liu,Lifeng Lin,Min Zhao,Lei Wang,Shaohua Chen,Jianzhi Huang
This study investigated innovative advanced oxidation processes (AOPs) combining far-UVC radiation at 222 nm with sodium percarbonate (SPC) to effectively remove methotrexate (MTX). UV222 significantly enhanced the direct photolysis and AOP degradation of MTX. •OH, CO3•–, and direct photolysis were primarily involved in the degradation, with their relative contribution being in the order •OH > CO3•– > direct photolysis. The fluence-normalized steady-state concentrations of both CO3•– and •OH in UV222/SPC were 7.76 and 4.05 times higher, respectively, than those in UV254/SPC. Transformation product analysis revealed distinct MTX degradation pathways and varied degradation rates of MTX substructures between the systems, with the order in UV254/SPC being 4-aminobenzamide (ABZ) > 2,4-diamino-6-(hydroxymethyl) pteridine (DHP) > l-glutamic acid (LG) and that in UV222/SPC being DHP > ABZ > LG, suggesting different reactivities of MTX moieties under each system. The presence of HCO3– and HA inhibited the MTX degradation, whereas NO3– promoted it, in the UV222/SPC system. In addition, UV222/SPC demonstrated a lower energy consumption compared to UV254/SPC, highlighting its potential for cost-effective wastewater treatment applications. This study offers new insights into the mechanisms of UV222/SPC systems and provides guidance for the development of technologies for the removal of emerging contaminants.
研究领域:
环境科学
·
化学工程
·
水处理
✓ 已验证
产品关联
DOI
高影响因子
危险品化学品经营许可证（带存储）