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Atomic layer deposition of TiO2 nanolayer coated Vectran fabrics with enhanced UV-blocking performance and structural colors

Jiahao He,Zhijiang Liu,Wenlu Zhang,Chong He,Wenbin Li

Vectran fabrics are widely employed as the key material for the manufacturing of stratospheric airship. Nonetheless, Vectran faber would decompose due to the UV aging during the prolonged flying process. Herein, atomic layer deposition (ALD) technology was introduced to coat TiO 2 nanolayers on the surface of Vectran fabrics. Titanium isopropoxide liquid was employed as the Ti source precursor throughout the deposition process. Compared with sol-gel vacuum infiltration technic, ALD modified Vectran yarns possessed higher surface uniformity, better UV blocking performance and lower density. Notably, thickness of the TiO 2 nanocoating prepared through the ALD method was adjustable, which can optimize the UV resistance of Vectran yarn without significantly affect its density. Additionally, the nanolayer interface can induce structural coloration on the Vectran strand via diffraction phenomena. These outstanding merits endow ALD technic a promising choice to modify the surface of Vectran fiber used as the skin of stratospheric airships.