摘要
Silicon monoxide (SiO x , 0 < x < 2) has been limited in commercial applications due to its low electrical conductivity and large volume expansion effect. The existing method is to use liquid phase method for carbon coating treatment, but some problems such as uneven coating are still exist. Therefore, in this paper, C 2 H 2 is used as carbon source to coat SiO x material in a rotating chemical vapor deposition furnace to obtain hard carbon coated SiO x (SiO x @C) material. At the rate of 0.5C (1C = 2.1 A g −1 ), the discharge specific capacity of SiO x @C remained at 1116.8 mAh g −1 after 140 cycles, which is 539.8 mAh g −1 higher than SiO x .
危险品化学品经营许可证(带存储)