Coexistence of free radical and nonradical mechanisms for triclosan degradation by CuO/HNTs

In this study, CuO/HNTs were applied to activate persulfate (PS) to firstly degrade and mineralize TCS. The morphology, crystal structure, specific surface and surface composition were characterized by SEM, TEM, BET, XRD and XPS. The experimental parameters were optimized with 0.2 g/L CuO/HNTs and 2 mM PS. TCS was totally removed in 180 min under optimized conditions. The mechanism study using the quenching reaction, EPR, XPS and electrochemistry demonstrated that even radical reactions (•OH and O 2 •- ) pathway existed; the nonradical mechanism ( 1 O 2 and surface electron transport) was dominant to the efficient TCS degradation. Using FT-ICR MS, the degradation intermediates were identified, and transformation pathways were proposed. The degradation intermediate studies indicated that TCS began to break from the aromatic ring containing monochlorine, and the Cl functional group was gradually substituted. CO 2 and H 2 O were generated with breaking of ether bonds. The toxicity of the solution was also evaluated by the survival rate of the luminescent bacteria, and the toxicity of the solution decreased overall. A stability study showed that CuO/HNTs retained good crystal structure and degradation efficiency even after 5 cycles.