A new strategy of binary-size particles model for fabricating fine grain, high density and low resistivity ITO target

A new strategy of 44&285 nm binary-size particles system has been proposed and discussed systematically for fabricating fine grain, high density and low resistivity indium tin oxide (ITO) target. Polyvinyl pyrrolidone (PVP) and Polyvinyl alcohol (PVA) were used as dispersant and adhesive. The effects from PVP, PVA, sintering temperature and holding time have been systematically investigated. The target, prepared by 44 nm powders with a sintering temperature of 1550 °C and a holding time of 10 h, shows a maximum relative density of 99.31% and a minimum resistivity of 4.17 × 10 −4  Ω cm. Moreover, based on 285 nm powders, the target sintered at 1550 °C for 10 h shows a maximum relative density of 99.27% and a minimum resistivity of 4.11 × 10 −4  Ω cm. Significantly, 44&285 nm binary-size particles system obviously increases the density and decreases the resistivity of target. And the maximum relative density, minimum resistivity and grain size are 99.57%, 0.92 × 10 −4  Ω cm and 1.34 μm, respectively. In this model, the two designed particle sizes satisfy a formula of d = ( 2 3 3 − 1 ) × D $d=(\frac{2}{3}\sqrt{3}-1)\times D$ . This new strategy contributes to preparing high-quality target, promoting the development of next generation ITO functional materials .