摘要
Chlorine-incorporating ultraviolet (UV) provides a multiple barrier for drinking water disinfection. Meanwhile, post-UV employment can promote the degradation of micropollutants by radical production from chlorine residual photolysis. This work studied the degradation of one such chemical, tonalide (AHTN), by low-pressure UV-activated free chlorine (FC) under typical UV disinfection dosage of <200 mJ·cm−2and water matrix of filtered tank effluent. AHTN was rapidly degraded by UV/FC in accordance with pseudo-first-order kinetics. The reaction rate constants of AHTN with reactive chlorine species and hydroxyl radical (HO•) were estimated. Mechanistic exploration evidenced that under UV/FC, AHTN degradation was attributable to direct photolysis, ClO•, and HO•. The carbonyl side chain of AHTN served as an important attack site for radicals. Water matrices, such as natural organic matter (NOM),HCO3−,Cu2+,PO43−, andFe2+, showed noticeable influence on the UV/FC process with an order of NOM >HCO3−>Cu2+>PO43−>Fe2+. Reaction product analysis showed ignorable formation of chlorinated intermediates and disinfection byproducts.Keywords:polycyclic musks;degradation mechanism;UV/chlorine advanced oxidation process;water treatment
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