Ciprofloxacin degradation in UV/chlorine advanced oxidation process: Influencing factors, mechanisms and degradation pathways

Ciprofloxacin (CIP) is a widely used third generation fluoroquinolone antibiotics, and has been often detected in wastewater treatment plants. Finding an effective way to remove them from wastewater is of great concern. Ultraviolet (UV)/chlorine advanced oxidation process (AOP) has many advantages in micropollutant removal. In this study, CIP degradation in UV/chlorine process was investigated. Only 41.2% of CIP was degraded by UV photolysis and 30.5% by dark chlorination in 30 min, while 98.5% of CIP was degraded by UV/chlorine process in 9 min. HCO 3 − had markedly inhibition, NO 3 − and SO 4 2- had slight inhibition, and Cl − had a marginal inhibition on CIP degradation in UV/chlorine system. The degradation of CIP in UV/chlorine process was mainly attributed to the attack of reactive species. The relative contributions of hydrated electrons (e aq ), hydroxyl radicals (HO ), chlorine atoms (Cl ), and UV photolysis were investigated. Under neutral condition in aqueous solution, CIP degradation had highest pseudo first-order reaction rate constant, in which e aq had the highest contribution, followed by Cl , HO , and UV photolysis. The intermediates and byproducts were identified and the degradation pathway was proposed. The total organic chlorine (TOCl) and biotoxicity were further assessed. CIP and natural organic matters (NOMs) were removed efficiently in real water. UV/chlorine showed the potential for the wastewater treatment containing CIP.