Band-gap engineering and comparative investigation of Ti2Nb10O29 photocatalysts obtained by Various synthetic routes

Ti 2 Nb 10 O 29 photocatalysts were successfully synthesized by three different methods. Ti 2 Nb 10 O 29 fabricated by the solvothermal method (ST-TNO) exhibited unique microspheres compared to the larger irregular particles observed for the samples annealed in air (Air-TNO) and Ar (Ar-TNO). X-ray Photoelectron Spectroscopy (XPS) results revealed that a partial reduction process from Ti 4+ into Ti 3+ occurs in Ar-TNO, because of the introduction of oxygen defects. Ar-TNO exhibited visible-light absorption with a band gap of 2.85 eV, while the absorption edges of Air-TNO and ST-TNO were approximately 400 nm. Under UV light irradiation (λ < 420 nm), Ar-TNO exhibited a photocatalytic activity 2.1 times greater than that of Air-TNO, corresponding to the highest activity. The results indicated that the preparation method is crucial for determining the band gap and photocatalytic activity of semiconductors. Moreover, the novel semiconductor photocatalyst can be further applied for constructing the heterojunction and designing the band structure.