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Novel α-Si3N4 planar nanowire superhydrophobic membrane prepared through in-situ nitridation of silicon for membrane distillation

Journal 2017 · IF 6.035 · 发表于 2017 年 8 月 22 日
作者: Lin Li,Jun-Wei Wang,Hao Zhong,Lu-Yuan Hao,Hamidreza Abadikhah,Xin Xu,Chu-Sheng Chen,Simeon Agathopoulos
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摘要

The α-Si 3 N 4 membrane was prepared by tape casting of silicon slurry, followed by calcination at 1300   °C in flowing NH 3 gas. It comprised of α-Si 3 N 4 nanowire of diameter 70   nm which were converted from silicon powder via the vapor–liquid–solid (VLS) growth mechanism. The surface of the obtained membrane was transformed from hydrophilic to superhydrophobic , with a high water contact angle of ~ 160°, by coating with a vesicular SiNCO nano-layer. The experimental results showed that nanowire structure also favored superhydrophobicity. Water desalination performance of the membrane was tested with a sweeping gas membrane distillation (SGMD) device. High water flux of 8.09   l   m −2   h −1 was achieved for 20   wt% NaCl aqueous solution in the feed at 90   °C, which was maintained for more than 500   h.

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