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A facile solvent activation process manipulates the structure and filtration performance of oxidized poly (arylene sulfide sulfone) TFC membrane

Journal 2024 · IF 8.3 · 发表于 2024 年 8 月 3 日
作者: Haohan Wan,Xinyi Yan,Jie Yang,Guangming Yan,Gang Zhang
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摘要

In this study, solvent-resistant polyamide (PA) thin film composite (TFC) nanofiltration (NF) membranes were successfully prepared based on an ultrasolvent-resistant oxidized poly (arylene sulfide sulfone) (O-PASS) substrate. The effects of different substrates on interfacial polymerization (IP) process were systematically studied. The O-PASS-TFC membranes were activated to different degrees by a controlled activation process using the mixture solvent of DMF/H 2 O with different ratio of DMF, the solubility power can be designed by adjusting DMF volume fraction, as the activation solvent. The membrane followed pure DMF treatment was found to have the excellent performance: the surface morphology of TFC membrane was activated to smooth and high negative charged, yield nanofiltration (NF) performance with a solution permeance of 8.82 LMH bar −1 (~621 % increase) and a pure water permeance (PWP) of 11.59 LMH bar −1 (~607 % increase), Na 2 SO 4 rejection maintained above 98.7 %. On the other hands, the same O-PASS-TFC membrane activated with solvent mixture volume ratio of DMF/H 2 O = 0.5 exhibited enhanced Na 2 SO 4 rejection of 99 %, with greater solution permeance of 3.01 LMH bar −1 (~212 % increase). The correlations between the different activation treatment-membrane structure-separation properties of O-PASS-TFC membranes with different solvent activation degrees were investigated in detail. In this work, the ultrasolvent-resistant property of O-PASS substrate was combined to regulate its TFC membrane structure, and then further to endow the TFC membrane with multiple excellent filtration performance by fully utilizing the solvent activation effect of DMF. Through this strategy, it supplies a facile and promising route for preparation of high efficiency TFC membrane.

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