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Built-in electric field mediated S-scheme charge migration and Co-N4(II) sites in cobalt phthalocyanine/MIL-68(In)-NH2 heterojunction for boosting photocatalytic nitric oxide oxidation

Journal 2024 · IF 9.4 · 发表于 2024 年 7 月 6 日
作者: Guojun Li,Zheng Lian,Qiuqiu Lyu,Chenyu Zhu,Zhinian Liu,Shule Zhang,Qin Zhong
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摘要

The efficiency of photocatalytic Nitric Oxide(NO) oxidation is limited by the lack of oxygen(O 2 ) active sites and poor charge carrier separation. To address this challenge, we developed a molecular Cobalt Phthalocyanine modified MIL-68(In)–NH 2 photocatalyst with a robust Built-in electric field(BIEF). In the 2 % CoPc-MIN sample, the BIEF strength is increased by 3.54 times and 5.83 times compared to pristine CoPc and MIL-68(In)–NH 2 , respectively. This BIEF facilitates the efficient S-scheme charge transfer, thereby enhancing photogenerated carrier separation. Additionally, the Co-N4(II) sites in CoPc can effectively trap the separated photoexcited electrons in the S-scheme system. In addition, the Co-N4(II) sites can also serve as active sites for O 2 adsorption and activation, promoting the generation of superoxide radical ( O 2 – ), thereby driving the direct conversion of NO to nitrate(NO 3 – ). Consequently, the 2 % CoPc-MIN sample exhibits a remarkable photocatalytic NO removal efficiency of 79.37 % while effectively suppressing the formation of harmful by-product nitrogen dioxide(NO 2 ) to below 3.5 ppb. This study provides a feasible strategy for designing high-efficiency O 2 activation photocatalysts for NO oxidation.

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