摘要
The toxicity of antibiotic and heavy metal combined pollutants is greater than single antibiotic, achieving its synergistic removal is the key. In this work, a novel g-C 3 N 4 /MoS 2 photocatalyst with hollow structure (CN/MS-V-3) was fabricated by one-step solvothermal method . As expected, CN/MS-V-3 showed an outstanding removal efficiency for tetracycline and Cu 2+ of 98.49% and 99.90%, respectively. The excellent photocatalytic degradation performance for tetracycline in compound wastewater mainly ascribed to the enhanced visible-light capture ability by hollow structure of CN/MS-V-3, formation 1 O 2 and ·OH, and the cycle of Cu 2+ /Cu + and Mo 2+ /Mo 4+ induced the fast electrons transport . The contamination of Cu 2+ in wastewater can play as an accelerator in the CN/MS-V-3 reaction system to improve the degradation performance of tetracycline. DFT results indicated that CN/MS-V-3 heterojunction was formed by combination of side surface MoS 2 –V and g-C 3 N 4 , and the Cu adsorption onto CN/MS-V-3 showed a potential formation of Cu–N and Cu–S bonds. In addition, the tetracycline degradation pathways and evaluation of toxicity of intermediates were also proposed. This work not only provides a promising technology for antibiotic and heavy metal combined contamination removal, but also a clever use of Cu variable valence to accelerate electron cycling to improve the removal performance of the CN/MS-V-3.
危险品化学品经营许可证(带存储)