摘要
Cultural relics reflect the vitality and creativity of human beings but are being irreversibly damaged with the current protective materials exhibiting high brittleness , easy crack and unsatisfactory protection. We fabricated a POSS-based polymer POSS- g -(PGMA- co -PFMA) 2 with high transparency, high hydrophobicity and adhesive nature by SI-ATRP. In addition to reducing the phase separation during film formation, the POSS-based polymer also improved the transparency (up to 99 %). The protected sandstone presented almost no changes (ΔΕ ⁎ = 1.34) on the chroma compared to the pristine sandstone. The polymer showed good surface hydrophobicity (glass: 100–105°; sandstone: 131°) and adhesive properties (0.44–2.59 MPa) which varied based on solvents. With increasing GMA content, there was gradual increase in the adhesive strength (0.59–2.68 MPa). Meanwhile, the POSS- g -(PGMA- co -PFMA) 2 film presented excellent freeze-thaw resistance and salt tolerance. As a kind of hydrophobic and bonding coating material suitable for harsh environments with high hydrophobic, high transparency, high thermal stability , and durability, it provides a new solution to solve the severe problem of cultural relics protection with a wide application prospect.
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