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In situ growth of large-scale and ultrathin carbon nitride films shield common metal substrates from corrosion and oxidation

Journal 2024 · IF 7.4 · 发表于 2024 年 10 月 3 日
作者: Liangliang Xiong,Huaning Jiang,Mengxue Wu,Yongji Gong,Xiaoqiang Fan,Minhao Zhu
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摘要

A centimeter-size carbon nitride (CN) film, with nanoscale thickness, is in situ deposited on various metals through the thermal condensation of melamine, achieving broad and uniform coverage, without any pre- and post-treatments. As the temperature rises, the nitrogen content in the film increases, leading to the part of CN to transform into g-C 3 N 4 . Benefit from higher Gibbs adsorption free energies of g-C 3 N 4 with Cl - and O 2 in aqueous environment, a 30 nm CN film deposited at 475 ℃ with large g-C 3 N 4 network, minimal segregation and low internal stress enables pure metals and alloys to achieve over 90 % protection efficiency.

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