摘要
An approach to fabricate protective film on copper substrate utilizing molybdate or tungstate assisted by dithiol was proposed. The fabricated films exhibited double-layer structure. The top layer was an organic layer primarily composed of interconnected dithiol molecules through disulfide bonds originating from the oxidation of molybdate or tungstate. The Cu 2 S bottom-layer formed as a result of the cleavage of C-S bonds subsequent to the adsorption of dithiol molecules onto the copper matrix. The molybdate participated the film via MoO x and MoS x . Although no tungstate species were detected in the film, the oxidizing effect of tungstate facilitated a conversion of dithiol molecules into polymers, resulting in a significantly thicker surface layer. The corrosion protection efficiencies of the films reached 99.7 % and 99.8 %, respectively, attributed to the incorporation of molybdate or tungstate additives. Theoretical calculations provided valuable insights into the process of film formation and elucidated the relationship between film structure and anti-corrosion performance.
危险品化学品经营许可证(带存储)