摘要
Electromagnetic interference (EMI) shielding materials combining high flexibility, exceptional electrical conductivity, lightweight properties, and superior shielding performance remain crucial for modern microelectronic applications. This study presents a secondary doping approach employing dodecylbenzenesulfonic acid (DBSA) and concentrated sulfuric acid (H2SO4) to engineer highly conductive poly(3,4-ethylenedioxythiophene):polystyrenesulfonate (PEDOT:PSS) films. While DBSA treatment induced gelation of the PEDOT:PSS matrix and achieved a 6-fold lower conductivity compared to H2SO4-treated samples (reaching 63.6 dB), it yielded exceptional EMI shielding performance with a remarkable specific shielding effectiveness of 12,960 dB cm2 g–1. This outstanding performance was attributed to the synergistic interplay between the development of a layered architecture within the film and the significant enhancement in film thickness. Furthermore, the PEDOT:PSS/DBSA films demonstrated exceptional environmental stability, maintaining shielding effectiveness above 60 dB under harsh conditions, a performance benchmark meeting stringent military-grade requirements. This study underscores the critical balance between conductivity and microstructure attributes in governing shielding performance and presents a promising avenue for the development of highly efficient, flexible EMI shielding materials.
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