摘要
Developing a highly efficient leveler in acid copper electroplating solution is one of the primary tasks necessary for achieving superconformal filling of microvias and interconnections in printed circuit boards (PCBs). Two triethylenediamine-based Gemini levelers, both with terminal quaternary ammonium groups, are synthesized and named as GL1(C8) after reaction of triethylenediamine with 1,8-dichlorooctane and GL2(C6 with two C–O linkages) after triethylenediamine with 1,2-bis(2-chloroethoxy) ethane. Electrochemical experiments indicate that at 100 rpm and 1000 rpm GL2combines with a suppressor and accelerator to exhibit greater potential difference of 23 mV than GL1in 9 mV for Cu2+reduction, demonstrating that GL2has a stronger synergistic convection-dependent adsorption (CDA) effect. Microvias copper electroplating experiments confirm that acid copper electroplating solution containing GL2achieve more effective superconformal void-free filling as it results in FP = 96.1%, while the solution containing GL1results in FP = 70%. Theoretical calculations indicate that adsorption energy of GL2is −1037.54 kJ·mol−1, which is lower than GL1(−1019.06 kJ·mol−1). GL2displays lower electron density compared to GL1, which facilitates its displacement by accelerator at the bottom. The lower adsorption energy of GL2suggests the weaker adsorption ability and the stronger CDA behavior.
危险品化学品经营许可证(带存储)