摘要
Metal–organic framework (MOF)-derived materials show great potential as highly efficient and stable electrocatalysts for the oxygen evolution reaction (OER). However, conventional derivation strategies (such as high-temperature calcination and chemical etching) often require harsh reaction conditions and inevitably compromise the structural integrity of the material, thereby limiting their practical applicability. To address this challenge, this study presents an innovative room-temperature dielectric barrier discharge (DBD) plasma surface engineering approach that enables the precise activation of CoNi-MOF-74 catalysts at room temperature. After DBD treatment, the surface of NF/PMOF is etched, generating cracks and exposing the nanoporous structure of the internal framework. Remarkably, through merely 5 min of DBD surface treatment, the resulting catalyst NF/PMOF5 achieves an ultralow overpotential of 173 mV at a current density of 10 mA cm–2 and a Tafel slope of 43 mV·dec–1, demonstrating a remarkable improvement compared to the untreated sample (307 mV, 109.5 mV·dec–1). The catalyst also exhibits outstanding stability, with minimal potential shift (<20 mV) after 4000 cycles. Detailed characterization reveals that the DBD treatment maintains the crystalline integrity of MOF-74 while simultaneously optimizing the electronic structure and generating high-density surface CoNi-oxide nanoclusters, which significantly enhance the OER kinetics. Owing to its green and mild treatment conditions, this noncarbonization activation strategy not only provides more options for MOF catalyst design but also demonstrates advantages in the processing of flexible electronic devices.
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