摘要
In this study, a 2-isopropyl-aminopyridine adduct of cobalt(II) chloride [Co(2- i PrNH-C 5 H 4 N) 2 Cl 2 ] was synthesized and used as a precursor for preparing cobalt-based films through chemical vapor deposition (CVD). This compound was synthesized through a simple coordination reaction and characterized through 1 H NMR, elemental analysis, and single-crystal diffraction. The thermal properties (including volatility, vapor pressure, and thermal stability) of the compound were investigated through thermogravimetric analysis (TGA) to determine its feasibility for use in CVD. Moreover, a film deposition experiment was conducted in a low-pressure CVD reactor system, and a Co 3 O 4 film was obtained. This result verified the reported compound’s applicability as a CVD precursor for fabricating cobalt-based films.
危险品化学品经营许可证(带存储)