Ablation behaviors and mechanisms of Cf/HfCPIP-SiCCVI composites: From SiO2 nanowires film to HfO2 skeleton

The ablation resistance of C f /HfC PIP -SiC CVI composites was tested under an oxyacetylene flame. After ablation, many SiO 2 nanowires were in-situ grown in the edge region. From the edge region to the transition region, the melting behaviors of SiO 2 nanowires was gradually intensified, and finally, they completely transformed into SiO 2 glass. At the border of the central region and the transition region, the HfO 2 grains were gradually precipitated from the SiO 2 glass and formed a tubular structure. By comparing the ablation behaviors at different temperatures and times, the ablation mechanisms of C f /HfC PIP -SiC CVI composites was investigated systematically.