Tunable structured AlGaN-based nanoporous distributed Bragg reflectors for light-coupling enhancement in monolayer MoS2

In this work, we demonstrated tunable structured AlGaN-based nanoporous (NP) distributed Bragg reflectors (DBRs) with high-reflectivity through one-step vertical-lateral electrochemical etching (ECE). The aperture of nanopores in the doping layer and the size and density of V-pits on the surface of NP-DBRs can be tuned by controlling the etching bias. Furthermore, by further tuning the thickness of alternating layers, we achieved high reflectivity of NP-DBRs at multiple center wavelengths within the wavelength range from 280 to 800 nm. To explore its potential applications, MoS 2 with a photoluminescence (PL) emission in the red light region was grown for the first time on the NP-DBRs. Due to the light localized effect of surface V-pits and the high reflectivity of the bottom DBRs , the PL intensity of MoS 2 was significantly enhanced by a factor of 37.3 compared to the region without NP-DBRs. The PL enhancement of MoS 2 on porous AlGaN and different periodic NP-DBRs further validated the PL enhancement mechanism. The corresponding theoretical simulations also revealed that the PL enhancement should be attributed to the combined effect of enhanced light absorption and NP-DBRs induced emission interference. The fabricated AlGaN-based NP-DBRs provide a new approach for improving the quantum efficiency of two-dimensional layered materials, which holds significant importance for advancing the development of miniaturized and integrated 2D/3D heterogeneous structure systems in the field of optoelectronics.