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Effect of sputtering pressure on the superconducting properties of Fe(Te,Se) films

Journal 2022 · IF 4.682 · 57(46): 21402-21410 · 发表于 2022 年 11 月 29 日
作者: Wang J.,Ou X. L.,Zhang J.,Chen X. Y.,Zhao K.,Yang X. S.,Zhao Y.
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摘要

Fe(Te,Se) is a simple, iron-based compound that is conducive to the study of superconductivity mechanisms and has potential for large-scale applications. At present, Fe(Te,Se) thin films are primarily prepared using the pulsed laser deposition method. Herein, FeTe 0.6 Se 0.4 films were grown by magnetron sputtering on CaF 2 substrates. The effect of sputtering pressure on the superconductivity of the film was investigated. Excessive pressure caused a higher iron content, which affected the superconductivity and prevented it from completely reaching a zero-resistance state. Δ T c was smaller for the film grown under 0.2 Pa, and its upper critical field reached 144.35 T, which indicates its greater application potential. Our results illustrated that sputtering pressure was a critical process parameter, which provided an important reference for future research to fabricate commercial iron-based superconducting tapes by magnetron sputtering.