摘要
The photosensitizer hypericin (Hyp) and the newly synthesized superhydrophobic nitrate-ester-group-capped Pillar[5]arenes (PNO) were employed to fabricate a sunlight-activated photodynamic antimicrobial mask by π-π and π-alkyl interaction via a simple co-spraying strategy. The superhydrophobic PNO layer effectively repels bacterial adhesion, while hypericin generates reactive oxygen species (ROS) under sunlight irradiation. This endows the as-prepared mask with excellent physical anti-adhesion barrier and efficient photodynamic inactivation against bacteria.
危险品化学品经营许可证(带存储)