Chitin/MoS2 nanosheets dielectric films with enhanced energy density by silane surface modification

Flexible dielectric capacitor has huge application potential in modern electronics and electrical power systems. In this work, chitin-based nanocomposite films were fabricated by integrating regenerated chitin (RCH) with two-dimensional molybdenum disulfide (MoS 2 ) nanosheets using a facile, cost-effective and environmentally benign approach. To enhance both the dispersion stability and interfacial compatibility between MoS 2 and chitin, 3-aminopropyltriethoxysilane (KH550) was introduced as a coupling modifier to functionalize the MoS 2 nanosheets surface. This strategy can improve the dielectric properties of the matrix when the surface-modified chitin/MoS 2 nanosheets applied to film dielectric capacitor. The experimental results demonstrate that the obtained RCH-MoS 2 @KH550 nanocomposite films enhanced breakdown strength and dielectric constant relative to the RCH and RCH-MoS 2 composite films. Notably, the RCH-MoS 2 @KH550 composite films containing 5 wt% MoS 2 @KH550 (RCH-MoS 2 @KH550 5) exhibited a discharge energy density of 4.7 J cm −3 at a breakdown strength of 400 MV m −1 , exceeding the RCH film by over twofold and showing an approximately 17% improvement compared with the unmodified RCH-MoS 2 5 composite films. This work highlights strategies for integrating biomass and MoS 2 nanocomposite materials in dielectric energy storage applications.