Bias voltage-controlled formation of TiSe2 coatings and their tribological performance on Ti-6Al-4V alloys

This study employed magnetron sputtering to deposit titanium selenide coatings on Ti-6Al-4V titanium alloy, aiming to improve wear resistance. By varying the polarity and magnitude of the bias voltage applied to the substrate surface, we identified the optimal process parameters for TiSe 2 formation. The results demonstrated that the coating surface hardness reached 16.0 GPa (increased by three times). In constant-load ball-on-disk friction tests, the friction coefficient decreased to 0.27 ± 0.041 with a reduced wear volume. This study provides a technical foundation for the preparation of titanium selenide coatings on titanium alloy surfaces.