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ACS Applied Nano Materials · 2021 · IF 5.097

CsCu2I3 Nanoribbons on Various Substrates for UV Photodetectors

Xing Xu,Chao Fan,Zhuodong Qi,Sha Jiang,Qin Xiao,Huikang Liang,Huigao Duan,Qinglin Zhang

Cesium copper (I) halides, as a lead-free halide material system, have shown great potential in optoelectronic devices due to their environmental friendliness, high quantum efficiency, and extraordinary air stability. However, most of the previous reports are on quantum dots, bulk crystals, or free-standing wires. It is still challenging to realize the in-plane growth of one-dimensional (1D) cesium copper (I) halides on various substrates, which is essential for nanodevices with high integration density. Herein, we report the planar growth of CsCu2I3 nanoribbons (NBs) with high-quality single crystals on diverse substrates through a spatial-confined method. The in situ investigation of the growth process reveals that the morphology evolution of the NBs is controlled by both thermodynamics and kinetics that are dependent on the local supersaturation near the NBs. The CsCu2I3 NB-based photodetectors (PDs) exhibit an outstanding ultraviolet (UV) detection performance with a high responsivity (0.27 A/W), a specific detectivity (6.38 × 108 Jones), and a fast photoresponse speed (trise/tdecay = 5.8/6.0 ms). Furthermore, the PDs exhibit high stability to light illumination and excellent flexibility to bending. The direct in-plane growth of the lead-free CsCu2I3 NBs on various substrates would promote the practical application of copper (I) halides in electronics and optoelectronics.

研究领域: 材料科学 · 光电材料 · 纳米技术
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Coatings · 2019 ·Vol. 9 ·期 7 ·421 · IF 2.33

A Self-Healing Coating with UV-Shielding Property

Lei Peng,Musong Lin,Sheng Zhang,Li Li,Qiang Fu,Junbo Hou

A self-healing coating with UV-shielding property was prepared in this paper. The self-healing property was based on the inclusion between a host (β-CD-TiO2) and a guest HEMA-Ad). After inclusion of the host and guest, the host–guest complex (HEMA-Ad/β-CD-TiO2) was polymerized with other reactive monomers (HEMA and BA) to obtain the final coating. The coating had good hydrophobicity (water contact angle >90°, moisture absorption rate <2%) and excellent UV-shielding performance (ultra-violet protect factor >90%), and could be firmly bonded to a soft substrate. In addition, the coating had good self-healing property, which means that cracks in the material can recover many times after being damaged and that the UV-shielding ability can be fully restored with the self-healing process.Keywords:coating;self-healing;UV-shielding;host–guest

研究领域: 材料科学 · 化学工程
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OPTICAL MATERIALS · 2024 · IF 3.8

Porous SiO2 antireflection film with high UV resistance

Yonghong Wu,Zhihang Shang,Zhaorui Li,Wenle Zhu,Lifang Nie,Juncheng Liu

Sol-gel is one of the most economical methods to prepare antireflection films, but the low ultraviolet radiation-resistance (UV-resistance) of the sol-gel film limits its applicability in the solar industry. A SiO 2 antireflection film was prepared with sol-gel method with phenyl salicylate (PS) as the porogen. The effects of the PS addition were investigated on the microstructure, optical property and UV-resistance of the film. When the addition of PS is 1.20 g, the refractive index at 550 nm is 1.30, and the maximum transmittance is 96.30 %. The average transmittance within the 400–1100 nm range reaches its peak at 92.85 %, which is 4.35 percentage points higher than that of the blank glass. In addition, the film without PS has an average transmittance of 91.00 % after 5000 equivalent solar hours (ESHs) UV irradiation, decreasing 1.07 percent point, and has a pencil hardness of 5 H and an adhesion of grade 2 of the tape-tearing method. However, the film with 1.20 g of PS still has an average transmittance of 92.15 % after 5000 ESHs UV irradiation, decreasing only 0.7 percent point, and has a pencil hardness of 7 H and an adhesion of grade 1 of the tape-tearing method.

研究领域: 材料科学 · 光学工程
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JOURNAL OF ALLOYS AND COMPOUNDS · 2026 · IF 6.7

High-detectivity Ni2+-doped CsPbI3 Nanorod UV Photodetectors

Tianze Wen,Xue Jiang,Jiawei Zheng,Shenao Wang,Jun Luo,Jinju Zheng,Bingsuo Zou,Jialong Zhao,Zhentao Du

Growth of qualified single-crystalline perovskite nanorods. High-purity, high-crystallinity Ni 2+ -doped CsPbI 3 nanorods are successfully prepared by introducing ion doping. • The substantially enhanced stability. The introduction of Ni 2+ doping improved the stability of the nanorods, allowing the Ni 2+ -doped CsPbI 3 nanorods to maintain their structural and optical integrity for more than 5 weeks under ambient conditions. • The overall excellent performance of the as-constructed PDs. The introduction of Ni 2+ doping reduced the defect concentration and carrier recombination rate. The detectivity of the photodetectors is comparable to the best-reported values among both undoped and ion-doped one-dimensional CsPbI 3 nanomaterial-based photodetectors (The Ni 2+ -doped CsPbI 3 nanorod PD has a responsivity of 1.08 × 10 3   A/W, a detectivity of 1.11 × 10 14 Jones, and an external quantum efficiency of 3.58 × 10 5 %, respectively). CsPbI 3 nanomaterials have attracted significant attention in optoelectronic devices due to their high carrier mobility and long diffusion length. Among them, one-dimensional (1D) CsPbI 3 nanomaterials offer more direct charge-carrier transport channels, making them ideal candidates for constructing high-performance micro/nanoscale photodetectors (PDs). However, CsPbI 3 nanomaterials still exhibit a high defect density within the crystal structure, which exacerbates carrier recombination. In this work, we successfully prepared Ni 2+ -doped CsPbI 3 nanorods with high crystallinity via a hot-injection method by partially substituting Ni 2+ for Pb 2+ . The as-prepared nanorods remain stable under ambient conditions for over five weeks. Ni 2+ doping reduces the defect-state density and electron–hole recombination rate of the CsPbI 3 nanorods. Meanwhile, the induced electronically active states facilitate photoexcitation, thereby collectively enhancing the photoelectric performance of the CsPbI 3 nanorods. The ultraviolet (UV) PD assembled based on Ni 2+ -doped CsPbI 3 nanorods exhibits excellent overall performance, featuring a detectivity of up to 1.11 × 10 14 Jones, which is comparable to the reported detectivity values of high-performance 1D CsPbI 3 -based photodetectors measured under different experimental conditions. This work provides some guidance for the development of high-performance UV optoelectric devices. Download: Download high-res image (194KB) Download: Download full-size image High-quality Ni 2+ -doped CsPbI 3 nanorods are successfully synthesized. The UV photodetector exhibits outstanding photoelectric performance, achieving a responsivity of 1.08 × 10 3   A/W, a detectivity of 1.11 × 10 14 Jones, and an external quantum efficiency of 3.58 × 10 5 %.

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JOURNAL OF AEROSOL SCIENCE · 2025 · IF 2.9

Performance evaluation of a miniature UV particle charger

Jitong Zhou,Gehang Huang,Xiaoqi Lei,Qiang Sun,Fajun Yu,Huaqiao Gui,Jianguo Liu,Huanqin Wang,Da-Ren Chen

A mini-UV aerosol charger was designed, and its charging performance was investigated in this work. The performance of a mini-UV aerosol charger was evaluated using DMA-classified silver (Ag) particles in the sizes ranging from 7 to 100 nm under varying exposure times and irradiation intensities. The intrinsic and extrinsic charging efficiencies, and charge distribution of test particles under different operational conditions were measured. It was found that the particle charging with 5 W UV lamps, emitting both wavelengths of 185 and 254 nm, achieved the optimal performance for the charger when operated at a flowrate of 0.3 LPM. The intrinsic and extrinsic charging efficiencies of sodium chloride (NaCl) and Di-Ethyl-Hexyl-Sebacat (DEHS) particles were also measured. The extrinsic charge distribution of test particles was lastly measured. This study further proposed the improvement of the photo-charging model based on the Fowler-Nordheim law (for the calculation of charge distribution of particles) by considering the field distribution of particle residence time in the charger.

CAS / MDL: 2432-87-3
研究领域: 气溶胶科学 · 分析化学 · 环境工程 · 纳米技术 · 生物医学工程
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Journal of Macromolecular Science Part A-Pure and Applied Chemistry · 2024 · IF 2.1

Preparation and properties of UV anti-corrosion ink

Weimin Yan,Chengmin Hou

At present, UV ink has been widely used in inkjet printing, screen printing, offset printing, and other fields. Compared with traditional ink, UV ink has faster curing speed, more stable performance, does not contain volatile organic solvents, and is less harmful to the human body. At present, the corrosion resistance of UV inks used in the market is very poor. This paper uses carbon-carbon double bond “C = C” + fluorine “F” to build anti-corrosion coating, which can greatly improve the corrosion resistance of UV ink. With azodiisobutyronitrile as initiator and tetrahydrofuran as solvent, α-methacrylic acid (MA) and styrene (St) were polymerized to form P(MA-r-St) under the condition of 40 °C magnetic stirring in a water bath after removing oxygen through nitrogen. P(MA-r-St) was esterified with trifluoroacetic acid under the catalysis of diethylenetriamine, and the prepolymer P(MA-r-St)-g-TFA of UV anti-corrosion ink was obtained. Monomer synthesis is done by mixing glycerol and acrylic acid with different molar ratios of 1:1, 1:2, and 1:3, and obtaining monomers with different double bond content through an esterification reaction. The effects of the type and content of photoinitiator, prepolymer, and monomer on the curing speed and contact angle of UV ink were studied, and the best UV curing system was explored. The best UV curing system is ITX with 1% photoinitiator, 50% prepolymer and 40% monomer. The contact angles of deionized water, 0.1 g/ml NaCl, 0.01 g/ml H2C2O4, and 0.01 mol/L NaOH were 94°, 92°, 96° and 98°, respectively. Apply the prepared UV anti-corrosion ink and ordinary UV ink evenly on the cover slide, and bake in the oven at 130 oC for 3 h. After drying, the weight is 0.187 g. The dried cover glass was soaked in 0.01 mol/L NaOH, 0.01 g/ml H2C2O4, 0.01 mol/L HCl, 0.01 mol/L KOH for 5–45 min. After soaking, it was baked in the oven at 130°C for 3 h. After drying, the mass was weighed with a balance, and the maximum mass loss was 7.7%. Compared with ordinary UV ink, the corrosion resistance of UV anti-corrosion ink has been improved, and the corrosion resistance effect is good, which proves that the synthesis of UV anti-corrosion ink is successful.

研究领域: 材料科学 · 化学工程 · 高分子科学 · 表面化学 · 印刷技术
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MARINE POLLUTION BULLETIN · 2023 · IF 5.8

Adsorption behaviors of chlorpyrifos on UV aged microplastics

Minggu Zhang,Na Liu,Lei Hou,Chao Li,Chengliang Li

Both non-degradable and biodegradable plastics can act as vectors of diverse organic pollutants. In this study, two types of biodegradable microplastics [poly (butylene adipate- co -terephthalate) (PBAT) and polylactic acid (PLA)] and one type of non-degradable microplastics [polypropylene (PP)] were selected to investigate the impacts of ultraviolet (UV) irradiation for one month on microplastics surface modification and their adsorption behaviors for chlorpyrifos (CPF). The study revealed that PBAT held the largest adsorption capacity, and PLA held the fastest adsorption rate. The UV irradiation diminished the adsorption capacities on PLA and PP but enhanced the adsorption capacities on PBAT. The adsorption capacity normalized by specific surface area revealed that specific surface area was the dominant factor for affecting the adsorption capacities on PP and PLA after UV irradiation. These findings further clarify the interaction between CPF and microplastics, and provide a theoretical basis for assessing the ecological risk of microplastics in water.

CAS / MDL: 2921-88-2
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LIQUID CRYSTALS · 2023 · IF 2.2

Polymer-dispersed liquid crystals with UV-shielding properties

Jianjing Gao,Ping Yu,Shengtao Zhu,Lifen Wen,Xingru Wang,Wenqi Song,Yuan Ge,Zemin He,Zongcheng Miao

Polymer-dispersed liquid crystal (PDLC) films are widely used in intelligent opto-electronic field owing to their electrically switchable properties. Previous studies have focused on the improvement of electro-optical properties of PDLC film in visible light bands; yet, the application of PDLC in other bands has few research. In this paper, vinylferrocene was introduced into PDLC films containing polyhedral oligomeric silsesquioxane (POSS) to improve UV-shielding properties. Scanning electron microscopy (SEM) studies revealed that vinylferrocene was uniformly dispersed in the polymer network. The structure could improve the electro-optical properties of PDLC film. The effect of temperature on PDLC film was studied. When the temperature reached 35°C, the PDLC composite film polymer network had better electro-optical properties. The PDLC composite films can effectively shield 86.73% UV light at on-state and 93.37% at off-state. The unique UV-shielding properties make this PDLC film a great application potential in smart windows. This PDLC combined with POSS and vinylferrocene film also exhibits large-area processability, which can further expand its application.

CAS / MDL: 4420-74-0
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MOLECULES · 2023 ·Vol. 28 ·期 14 ·5523 · IF 4.6

Fluorinated Polyimide/Allomelanin Nanocomposites for UV-Shielding Applications

Qing Li,Yujuan Guo,Meijia Wu,Fei Deng,Jieying Feng,Jiafeng Liu,Sheng Liu,Chaoliu Ouyang,Wengui Duan,Shunmin Yi,Guangfu Liao

A series of highly fluorinated polyimide/allomelanin nanoparticles (FPI/AMNPs) films were prepared with FPI as the matrix and AMNPs as the filler. Due to the formation of hydrogen bonds, significantly reinforced mechanical and UV-shielding properties are acquired. Stress–strain curves demonstrated a maximum tensile strength of 150.59 MPa and a fracture elongation of 1.40% (0.7 wt.% AMNPs), respectively, 1.78 and 1.56× that of pure FPI. The measurements of the UV-vis spectrum, photodegradation of curcumin and repeated running tests confirmed the splendid UV-shielding capabilities of FPI/AMNPs films. The enhancement mechanisms, such as synergistic UV absorption of the charge transfer complexes in FPI and AMNPs and photothermal conversion, were the reasons for its exceptional UV shielding. The excellent comprehensive properties above enable FPI/AMNPs nanocomposites to be potential candidates in the field of UV shielding.Keywords:polyimide;allomelanin;mechanical properties;UV-shielding properties;nanocomposite

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ENVIRONMENTAL SCIENCE & TECHNOLOGY · 2021 · IF 9.028

UV-Induced Redox Conversion of Tellurite by Biacetyl

Hongcen Zheng,Li Zhang,Guoyang Zhang,Yonghai Gan,Min Xie,Shujuan Zhang

Tellurium (Te) is a rare element of great value, but it exists mainly in the toxic form of tellurite (TeIV) in water. Effective approaches that are able to reduce the toxicity and recover Te from contaminated water are highly needed. Here, we developed a simple but effective way to reduce toxic TeIV to widely applicable elemental Te0. With the combination of ultraviolet (UV) and biacetyl (BD), the oxidation state of Te could be feasibly changed from IV to 0 or VI. The consumption of dissolved oxygen (DO) was a key factor in the redox conversion of TeIV. Under UV irradiation, BD was first cleaved to acetyl radicals, which could then combine with water molecules to form more reductive diol radicals or combine with DO to form strongly oxidative peroxide radicals. Even without deoxygenation, the UV/BD system could rapidly change from being oxidative to being reductive because of the fast depletion of DO. Owing to the high quantum yield of the acetyl radical, the reduction efficiency of the UV/BD system was about 1 order of magnitude higher than that of UV/sulfite and was more efficient than the commonly used biological methods. This work provides a proof of concept for the reduction of tellurite, which could have relevant implications for water treatment and resource recovery applications.

CAS / MDL: 13762-51-1 75-65-0
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JOURNAL OF APPLIED POLYMER SCIENCE · 2023 ·Vol. 140 ·期 47 ·e54711 · IF 3

Application of ferrocene-grafted polyethylene as UV-absorbers

Yin Zhang,Yu Wang,Wei You

Based on derivatization of commercial poly(ethylene- co -vinyl acetate) (EVA), novel macromolecular UV-absorbers with polyethylene (PE) backbones and ferrocene side groups are presented in this study. The structures and properties of the polymers were analyzed using various techniques including Fourier transform infrared spectroscopy (FT-IR), proton nuclear magnetic resonance ( 1 H NMR), thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), scanning electron microscope (SEM), and UV visible absorption spectroscopy. UV analysis experiments have shown that PE-grafted ferrocenyl ester (PE- g -FE) and PE-grafted azacyclo-ferrocene (PE- g -AF) with ferrocene side groups have the potential to act as UV absorbers. By using the polymers as additives for commercial PE, the anti-migration experiment demonstrates that PE- g -AF, with a heterocyclic structure, exhibits superior anti-migration performance than the ester-linked PE- g -FE. Furthermore, in comparison to commercial small-molecular UV absorbers (UV-329), the PE- g -AF absorber not only exhibits better UV absorption performance but also demonstrates almost zero migration behavior within the PE matrix.

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CHEMOSPHERE · 2020 · IF 5.778

Sulfamethoxazole degradation by UV-Fe3+ activated hydrogen sulfite

Shixiang Wang,Guangsheng Wang,Yongsheng Fu,Yiqing Liu

Exploration of novel advanced oxidation systems with high efficiency toward radical generation is of significant importance due to the extensive and versatile application of reactive species in the wastewater treatment . Herein we report a simple UV-catalytic homogeneous advanced oxidation system (UV/Fe 3+ /hydrogen sulfite (BS)), which is capable of generating abundant radicals (e.g., SO 3 - , SO 4 - , SO 5 - and HO ) in the aqueous environment. Sulfamethoxazole (SMX) degradation using this system was tested. Results indicated that SMX could be degraded effectively by UV/Fe 3+ /BS and sulfate radical (SO 4 - ) and hydroxyl radical (HO • ) were verified to be presented in this system and be contributive to SMX removal. The acidic pH (4.0) and a low BS/Fe 3+ ratio (10:1) were suitable for SMX degradation. The presence of fulvic acid (FA) and HCO 3 − strongly inhibited the degradation of SMX, but obvious acceleration was observed in the presence of NO 3 − due to its contribution on additional radical generation by photosensitization. Based on the detected transformation products through LC-MS analysis, the degradation pathway of SMX by UV/Fe 3+ /BS was proposed including hydroxylation and bond cleavage.

CAS / MDL: 723-46-6
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