JOURNAL OF MATERIALS CHEMISTRY
·
2012
·Vol. 22
·期 40
·21426-21433
·
IF 5.968
Peng Zhang,Jia Guo,Changchun Wang
A novel multifunctional conjugated nanoporous polymer colloid (CNPC) combined with metal nanocrystals has been synthesized using the Sonogashira coupling reaction in a toluene-in-water miniemulsion. It is composed of a poly(phenylene ethynylene) (PPE) network that is covalently inlaid with the locked-in Fe3O4 nanocrystals. The Fe3O4@CNPC has a narrowly distributed size and uniform morphology, preserves the advanced porosity and fluorescence emission of the conjugated polymer network, and shows rapid magnetic response and high catalytic activity. The magnetic content can be controlled during the synthesis. This is accompanied by a corresponding enhancement of the size and surface area of the mesopores. In view of those characteristics, Fe3O4@CNPC is able to behave as fluorescence sensor for the detection of phenolic compounds. Acetaminophen (APAP) has been used as a model compound and the test results demonstrate that the Fe3O4-catalyzed oxidation of APAP takes place within the pores of the PPE network in the presence of H2O2. The oxidized intermediates are reactive radicals and can remove electrons from the π-conjugated PPE network, eventually leading to a decrease or even quenching of its fluorescence. Since the multiple functions of Fe3O4@CNPC fully cooperate, it produces a rapid optical response and superior sensitivity for the detection of APAP at micromolar concentrations.
研究领域:
分析化学
·
纳米医学
·
生物传感
·
药物代谢
·
材料科学
·
分子探针
·
环境毒理学
✓ 已验证
DOI
高影响因子
JOURNAL OF MEMBRANE SCIENCE
·
2025
·
IF 9
Kai Mi,Congcong Yin,Sen Xiong,Yanqiu Lu,Yong Wang
Conjugated microporous polymers (CMPs), characterized by permanent microporosity and exceptional stability, represent a promising class of materials for next-generation molecular-sieving membranes. Nevertheless, high-quality CMP membranes with well-designed pore architectures remain inaccessible due to the challenges associated with processing these materials. Herein, we report a molecular layer deposition (MLD) process for the sequential assembly of 3-butylthiophene and 3,3′-bithiophene in situ on commercial nanofiltration substrates under MoCl 5 oxidation. The precise MLD strategy enables the integration of flexible alkyl chains to soften the CMP backbone while preserving its intrinsic microporosity. The resulting composite CMP membranes enabled high-resolution purification of nanoscale species with molecular weights as low as 270 g mol −1 while exhibiting exceptional long-term stability during continuous operation over 150 h. We also proved that thus-prepared CMP membranes exhibit great potential for the purification and recovery of high-value pharmaceuticals and catalysts. This work highlights the potential of MLD as a versatile strategy for fabricating CMP membranes and grafting internal functionalities, enabling high-resolution separation in liquid systems.
研究领域:
材料科学
·
膜技术
·
高分子化学
·
分离科学
·
有机溶剂纳滤
✓ 已验证
产品关联
DOI
高影响因子
Food Bioengineering
·
2024
·Vol. 3
·期 2
·151-159
·
IF 0
Ziye Zhao,Ning Nie,Xinwei Li,Ye Shi,Xudong Liu,Yifei Zhang
Nucleotides, such as uridine 5′-monophosphate (5′-UMP) and cytidine 5′-monophosphate (5′-CMP), are heavily demanded as food additives, dietary supplements, and medicinal intermediates. Although enzymatic phosphorylation is an effective approach to producing these nucleosides, its practical application is challenging due to the need for the expensive enzymes and coenzyme guanosine-5′-triphosphate (GTP). Here we prepared biocompatible calcium-based nanoflowers incorporated with cascade enzymes, uridine-cytidine kinase (UCK) and acetate kinase (ACK), for the production of nucleotides. The spatial distribution of these enzymes was optimized to maximize their catalytic performances. The most active nanoflowers (Ca 3 (PO 4 ) 2 & ACK)& UCK that display the rate-limiting enzyme UCK on the outer layer were used in a packed-bed reactor for continuous synthesis of 5′-UMP and 5′-CMP. The catalytic performance of the catalyst retained over 80% within 10 h, showing good operational stability.
研究领域:
生物催化
·
纳米技术
·
酶工程
·
生物化学
·
食品科学
·
药物化学
✓ 已验证
DOI
CORROSION SCIENCE
·
2025
·
IF 8.5
Jiahui Ma,Yating Huang,Jie Cheng,Qinhua Miao,Jinchi Chen,Shirong Ge
Cu and Co serve as interconnect metals in back-end-of-line (BEOL) integrated circuit fabrication. Chemical mechanical polishing (CMP) achieves planarization through chemical oxidation and dissolution by slurry components, which inevitably causes excessive corrosion and surface defects. Consequently, a critical aspect of metal CMP slurry engineering involves suppressing surface defects from both electrochemical and triboelectrochemical effects. Selecting effective corrosion inhibitors is crucial for optimizing both material removal rate and surface quality. In this work, typical azole inhibitor 1, 2, 4-triazaole (TAZ) was systematically evaluated for both the Cu and Co polishing slurries. Corrosion kinetics and thermodynamic parameters were determined by analyzing temperature-dependent corrosion current density variations. Electrochemical results demonstrate that TAZ significantly elevates apparent corrosion activation energies from 13.84 to 20.98 kJ·mol⁻¹ for Co and 13.51–44.78 kJ·mol⁻¹ for Cu, while achieving superior inhibition efficiency for Cu ( η = 80.97 % at 2 mM) compared to Co ( η = 30.68 % at 10 mM). KPFM and DFT calculations confirm substantially increased work function on Cu surfaces even at low TAZ concentrations. Moreover, triboelectrochemical measurements reveal divergent friction-driven mechanisms where mechanical action enhances cathodic processes on Co, shown by positive OCP shifts, but promoting anodic dissolution on Cu through negative OCP shifts. TAZ effectively mitigates tribocorrosion by forming lubricating adsorption layers that reduce coefficients of friction by over 40 % and suppress material loss. These insights provide a fundamental basis for the rational screening and selection of inhibitors optimized for dynamic CMP conditions.
研究领域:
材料科学
·
微电子制造
·
表面工程
·
电化学
·
腐蚀科学
·
半导体工艺
✓ 已验证
产品关联
DOI
高影响因子
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
·
2015
·
IF 1.517
Yang Chen,Zhina Li,Cheng Qian
To improve the structural stability of the core–shell organic–inorganic composite abrasives during chemical mechanical polishing (CMP) processes, the polystyrene (PS) coated silica composites with homogeneous shells (amorphous silica networks, 15–20 nm in thickness) were synthesized via the sol–gel process of tetraethoxysilane at acidic aqueous condition in the presence of PS colloids (210–540 nm). Transmission electron microscopy and scanning electron microscopy were applied to characterize the as-synthesized samples. The effects of particle sizes and polishing pressures on oxide CMP performance were explored by atomic force microscopy. The results indicated that the obtained composite abrasives exhibited excellent polishing performance and structural stability during polishing processes. With the increase of the polishing pressures (13.8–41.4 kPa), the layer removal rate (RR) increased correspondingly, while the root-mean-square (RMS) roughness of polished substrates decreased firstly and then increased. Moreover, the RR and RMS for the composite abrasives increased with the increase of PS core sizes. At a given polishing pressure of 27.6 kPa, the highest RR (82.5 ± 7 nm/min) was obtained for the PS coated silica composites with largest cores (ca. 540 nm), while the lowest RMS roughness (0.189 ± 0.02 nm) was observed for the composites with smallest cores (ca. 210 nm). Furthermore, the polishing results in our CMP experiments were rationalized according to the indentation-based material removal mechanism (Chen et al. Appl Surf Sci 2012; 258:8469–74).
✓ 已验证
产品关联
DOI
高影响因子
TRIBOLOGY INTERNATIONAL
·
2025
·
IF 6.9
Bin Hu,Xinhuan Niu,Jiakai Zhou,Changxin Dong,Chao He,Xinjie Li,Zheng Wu,Jiahui Li
The development of sapphire slurry follows the principles of compositional simplification, environmental sustainability, and high efficiency with low cost. This study systematically investigated the effects of polyhydroxyamine pH regulators, 2-amino-2-methyl-1-propanol (AMP), 2-amino-2-methyl-1,3-propanediol (AMPD), and tris(hydroxymethyl)aminomethane (TRIS), on the polishing performance of C-, R-, and M-plane sapphire substrates. The results demonstrated that TRIS exhibited the highest efficacy, achieving material removal rates (MRRs) of 5.512 µm/h, 3.422 µm/h, and 4.541 µm/h for C-, R-, and M-plane sapphire, respectively, while reducing surface roughness (Sq) to 0.191 nm, 0.178 nm, and 0.184 nm. Tribological analysis, SEM characterization, zeta potential measurements, particle size distribution tests, and spectroscopic techniques (UV-Vis, XPS, and FTIR) were employed to elucidate the mechanical and chemical mechanisms governing material removal. All three pH regulators can also function as complexing agents, forming complexes with Al OH 4 − , with TRIS demonstrating the strongest chelation capability. Density functional theory (DFT) calculations further verified these findings, revealing that TRIS possesses the highest number of reactive sites. The consistency between computational and experimental results established a quantitative structure-performance relationship. This work provides a green and efficient paradigm for the precision machining of hard, brittle materials.
研究领域:
材料科学
·
表面工程
·
半导体制造
·
计算化学
·
机械工程
·
电子材料
✓ 已验证
产品关联
DOI
高影响因子
ADVANCED FUNCTIONAL MATERIALS
·
2025
·
IF 19
Yanran Hou,Zi-Han Chen,Hui Shen,Simin Li,Xinping Qu,Baimei Tan,Wei Yuan,Fan Zhang
In the pursuit of Moore's Law, the transition to integrated circuits (ICs) and atomic-scale device fabrication places pressure on chemical mechanical polishing (CMP) to deliver flawless surfaces. Moving beyond conventional abrasives, ultra-small and monodisperse ceria nanoparticles have arisen as a critical materials platform. Tailoring their size, composition, and surface properties is important to simultaneously achieving high polishing selectivity and sub-angstrom smoothness. However, CeO 2 abrasives with ultra-small particle sizes are plagued by challenges in production, colloidal instability leading to agglomeration, and relatively low polishing rates. Herein, we report a universal doping-mediated activity adjusting platform and successfully develop ultrasmall CeO 2 mesoporous nanoabrasive. USM-Ce, with sizes under 30 nm, exhibits uniform morphology and excellent dispersibility. Theoretical calculations combined with various characterization reveal that the constructed doping regulation platform effectively reduces the formation energy of oxygen vacancies in USM-Ce, thereby markedly increasing the concentration of both oxygen vacancies and Ce 3+ ions. Notably, USM-Ce can further enhance the material removal rate to 232% of the original through doping regulation. Meanwhile, the proposed ultrasmall abrasives deliver an atomically planarized, nearly scratch-free surface with an angstrom-level finish. The newly developed mesoporous CeO 2 nanoparticles offer a versatile platform for ultrasmall ceria-based nanoabrasives in critical advanced IC manufacturing processes.
研究领域:
材料科学
·
半导体制造
·
纳米技术
·
表面工程
·
化学机械抛光
✓ 已验证
产品关联
DOI
高影响因子
危险品化学品经营许可证（带存储）