Journal of Environmental Chemical Engineering
·
2026
·
IF 7.5
Jia-Jing Lyu,Qing Bai,Qian-Yuan Wu,Yu-Jia Nong,Mu-Da Han,Min-Yong Lee,Zhong-Quan Ren,Jiang-Lei Xiong,Wen-Long Wang
Far-UVC at 222 nm (UV 222 ) is a promising alternative of conventional 254 nm (UV 254 ) lamps for microorganism inactivation and recalcitrant pollutant removal. This study evaluates UV 222 combined with chlorine (HOCl/OCl⁻) for removing 1H-benzotriazole (BTZ), a widely used UV-absorber and anticorrosion agent ubiquitously detected in wastewater, surface water, and swimming pools. UV 222 achieved 1.4−21.7 times faster direct photolysis of BTZ compared to UV 254 , attributed to higher quantum yield (3.0−32.4 enhancement). UV 222 /chlorine demonstrated strong synergies (factors of 3.7–16.3 across pH 5.0–10.0), consistently outperforming UV 254 /chlorine by 1.09–2.02-fold. Kinetic modeling revealed that UV 222 generates reactive radicals more efficiently, with innate quantum yields for HOCl and OCl⁻ photolysis being 1.7-fold and 4.0-fold higher than UV 254 , respectively, resulting in elevated steady-state concentrations of • OH, Cl • , and ClO • . Reactive chlorine species contributed 47.5%–72.9% to BTZ degradation. Notably, under alkaline conditions where OCl⁻ dominates, UV 222 /chlorine showed substantially greater advantage over UV 254 /chlorine, as UV 222 appears to mitigate the marked reduction in OCl⁻ efficiency. In complex water matrices, nitrate (≥0.5 mM) acted as a photosensitizer, enhancing BTZ removal, while humic acid caused moderate inhibition (16.8%−44.0%). In tap water and secondary effluent, UV 222 /chlorine achieved 1.39–3.86 times higher degradation than in deionized water, with nitrate-driven radical generation outweighing natural organic matter inhibition. Importantly, UV 222 /chlorine produced 23% lower chlorinated disinfection byproducts (DBPs) and 17% lower toxicity-index than UV 254 /chlorine, demonstrating its potential as an alternative of UV 254 -driven oxidation process.
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高影响因子
WATER RESEARCH
·
2024
·
IF 11.4
Qing Bai,Qian-Yuan Wu,Bei Ye,Yun-Peng Wu,Ju-Won Lee,Min-Yong Lee,Wen-Long Wang
The KrCl* excimer lamp (UV222) is a promising alternative of low-pressure mercury lamp (UV254) for UV-based advanced oxidation processes (UV-AOPs), because it is mercury-free and has high photon energy. But there lacks a comprehensive assessment of UV222-AOPs based on different radicals. Herein, the properties (e.g., oxidant decay and innate radical quantum yield), and micropollutant degradation, were comprehensively studied for representative oxidants (i.e., hydrogen peroxide, persulfate (PDS), monochloramine, and free active chlorine (FAC)) under UV222 irradiation. UV222 outperformed UV254 for the activation of oxidants with 2.6-14.4 times fluence-based kinetic constant ( k F ). The main reason of enhanced activation varied with oxidants: higher UV absorption for H 2 O 2 , higher innate quantum yield for monochloramine and FAC, and both reasons for PDS. Overall, PDS was the optimum oxidant under UV222 for the degradation of 8 representative micropollutants because of effective promotion of radical formation, as confirmed by radical competitive kinetics and modeling simulations. In real water, UV222/PDS still show advantages than UV254/PDS in terms of micropollutant elimination efficacy (3.2-5.3 times) and energy consumption (33.9%-57.6% lower) though it was more inhibited by water constituents via competing for UV222 photons. This study fills gaps in photochemistry knowledge and will facilitate engineering practice of UV222-AOPs.
研究领域:
环境科学
·
化学工程
·
光化学
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PubMed
高影响因子
WATER RESEARCH
·
2024
·
IF 11.4
Chen-Yan Hu,Li-Li Hu,Zheng-Yu Dong,Xin-Yu Yang,Hao Liu,Jia-Nan Chen,Ling-Mei Gao
Krypton chloride (KrCl*) excimer lamps (222 nm) are used as a promising irradiation source to drive ultraviolet-based advanced oxidation processes (UV-AOPs) in water treatment. In this study, the UV 222 /peracetic acid (PAA) process is implemented as a novel UV-AOPs for the degradation of emerging contaminants (ECs) in water. The results demonstrate that UV 222 /PAA process exhibits excellent degradation performance for carbamazepine (CBZ), with a removal rate of 90.8 % within 45 min. Notably, the degradation of CBZ in the UV 222 /PAA process (90.8 %) was significantly higher than that in the UV 254 /PAA process (15.1 %) at the same UV dose. The UV 222 /PAA process exhibits superior electrical energy per order (EE/O) performance while reducing resource consumption associated with the high-energy UV 254 /PAA process. Quenching experiments and electron paramagnetic resonance (EPR) detection confirm that HO• play a dominant role in the reaction. The contributions of direct photolysis, HO•, and other active species (RO• and 1 O 2 ) are estimated to be 5 %, 88 %, and 7 %, respectively. In addition, the effects of Cl − , HCO 3 − , and humic acid (HA) on the degradation of CBZ are evaluated. The presence of relatively low concentrations of Cl − , HCO 3 − , and HA can inhibit CBZ degradation. The UV 222 /PAA oxidation process could also effectively degrade several other ECs (i.e., iohexol, sulfamethoxazole, acetochlor, ibuprofen), indicating the potential application of this process in pollutant removal. These findings will propel the development of the UV 222 /PAA process and provide valuable insights for its application in water treatment.
研究领域:
环境科学
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水处理技术
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PubMed
高影响因子
JOURNAL OF HAZARDOUS MATERIALS
·
2025
·
IF 11.3
Youn-Jun Lee,Sung-Hyo Jung,Chang-Gu Lee
Low-molecular-weight organic pollutants present in feed water pose a significant challenge to maintaining ultrapure water (UPW) quality, as they are not readily removed by conventional treatment processes. Urea is a low-molecular-weight, nonionic, persistent organic pollutant resistant to conventional UPW production processes. Therefore, suitable oxidation technologies must be explored to convert urea to inorganic nitrogen ions, which are more easily removed in post-UPW treatment steps. In this study, the far-UVC (peak wavelength centered at 222 nm) coupled persulfate (PS) activation system was used for the effective oxidation of urea to nitrate (NO 3 − ). In the degradation of urea (10 μM, PS 0.4 mM, pH 7), far-UVC/PS systems (k urea,222/ PDS= 1.69 × 10 −3 cm 2 ∙mJ −1 , k urea,222/PMS = 2.69 ×10 −4 cm 2 ∙mJ −1 ) were found to be superior to conventional 254 nm LPUV/PS systems (k urea,254/PDS = 1.07 ×10 −4 cm 2 ∙mJ −1 , k urea,254/PMS = 7.01 ×10 −5 cm 2 ∙mJ −1 ). The far-UVC/PDS system showed the highest efficiency, achieving complete urea removal after 5241.0 mJ∙cm −2 of irradiation. The dominant role of SO 4 •− in urea degradation was systematically investigated, with urea removal showing a strong correlation with the steady-state concentration of SO 4 •− . Moreover, the evolution of inorganic nitrogen species and the reduction of total organic carbon were examined to assess the applicability of the system as a pretreatment technology in UPW production. The results provide valuable insights into the integration of the far-UVC process for the removal of low-molecular weight pollutants during UPW production.
研究领域:
环境工程
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水处理化学
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高级氧化技术
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分子生物学
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环境光化学
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水质净化
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高影响因子
LWT-FOOD SCIENCE AND TECHNOLOGY
·
2020
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IF 4.006
Liumin Fan,Xiao Liu,Xiuping Dong,Shanshan Dong,Qisen Xiang,Yanhong Bai
Ultraviolet light-emitting diodes (UV-LEDs) have become widespread for decontaminating the surfaces of food products and their packaging as a safer alternative to traditional mercury-vapor based UV lamps. This study aimed to investigate the effect of UVC- LEDs (275 nm) on the inactivation of foodborne pathogens and quality attributes of raw tuna fillets. Raw tuna fillets inoculated with cocktails of Salmonella Typhimurium, Listeria monocytogenes , and Escherichia coli O157:H7 were exposed to UVC-LEDs at 500-4000 mJ/cm 2 . UVC-LED treatments of single-layer tuna fillets at a dose of 4000 mJ/cm 2 resulted in 1.31-, 1.86-, and 1.77- log reduction of S . Typhimurium, L . monocytogenes , and E . coli O157:H7, respectively. The pH value, water-holding capacity, metmyoglobin, texture, and color characteristics of tuna fillets were not significantly ( p > 0.05) changed following the UVC-LED treatment at radiation doses up to 4000 mJ/cm 2 . Nonetheless, the UVC-LED irradiation led to increased levels of lipid oxidation in tuna fillets. Overall, the present study demonstrates that UVC-LEDs are a promising technology to reduce microbial flora and maintain the physicochemical properties of fish products.
研究领域:
食品科学
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微生物学
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高影响因子
JOURNAL OF MOLECULAR STRUCTURE
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2026
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IF 4.9
Yifeng Shi,Peng Xi,Zhen Han,Bowen Cheng
Amino acid derivatives are widely designed and synthesized as UV absorbers for Anti-UV applications due to their green nature, non-toxicity, and renewability. However, there are still certain challenges in the systematic research on their high-efficient synthesis and exploring new application areas. Herein, nine novel benzoyl amino acid derivatives were synthesized via a solution-phase reaction using three amino acids (glycine, alanine, and phenylalanine) and benzoyl-based compounds. The molecular structures were confirmed by 1 H NMR, 13 C NMR, MS and FTIR spectroscopy. SEM revealed their block and rod-like microstructures and XRD confirmed low crystallographic symmetry. DSC and POM indicated melting points near 150 °C and optical anisotropy upon heating. UV-Vis and photoluminescence spectra demonstrated strong optical absorption and blue-to-green emission. The synthesized derivatives were optimized with frequency analyses at the M062X/6-311g(d,p) level. These optimized structures were further characterized by different quantum chemical approaches. A biodegradable transparent film was prepared by embedding the derivatives into polylactic acid via solution casting. The resulting film exhibited excellent UV-shielding performance in the 190-290 nm range, with a maximum interception rate of 97.09 %. These results provide an important theoretical basis for the development of new amino acid derivatives and membrane materials with biodegradable properties and excellent UV-shielding performance.
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CHEMOSPHERE
·
2023
·
IF 8.8
Jing Lou,Jiutao An,Xiangyou Wang,Xiaonan Yang,Guanglu Lu,Liang Wang,Zitong Zhao
A systematic investigation of coupling dielectric barrier discharge (DBD) plasma and different ultraviolet bands (UVA, UVB, UVC, and VUV) was constructed for antibiotic-contaminant wastewater treatment . Compared with DBD, UV, or other combined DBD/UV systems, the DBD/VUV/UVC system exhibited excellent degradation and mineralization efficiencies for oxytetracycline (OTC), achieving 93.2% removal rate (reaction rate constant 1.05 min −1 ) and higher decarbonization efficiency (mineralization rate 0.47 mg C min −1 ) within 2.5 min treatment. The radical quenching tests revealed that HO⋅, O 2 · - , and 1 O 2 were all involved in the decomposition of OTC in the DBD/VUV/UVC system, among which O 2 · - played a dominant role. Possible degradation pathways of OTC in the DBD/VUV/UVC process were proposed using density functional theory and detected intermediates. Four indexes were used to assess the toxicity of OTC and its degraded intermediates. The inorganic anions and HA slightly reduced the degradation efficiency of the DBD/VUV/UVC system. This research provides new ideas to broaden the application of plasma and alleviate the water environment crisis.
研究领域:
环境科学
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水处理
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等离子体化学
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药学
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JOURNAL OF HAZARDOUS MATERIALS
·
2024
·
IF 12.2
Tao Yang,Ge Zeng,Maoju Jiang,Peng Su,Chenlong Liu,Qixiao Lv,Wenqi Li,Xiangyang Hou,Juan Li
Periodate (PI)-based advanced oxidation processes have gained increasing interest. This study for the first time elevates the light-activation capacity of PI by using far UVC at 222 nm (UV 222 /PI) without extra chemical inputs. The effectiveness and the underlying mechanisms of UV 222 /PI for the remediation of micropollutants were studied by selecting atenolol (ATL) as a representative. PI possessed a high molar absorption coefficient of 9480–6120 M −1 cm −1 at 222 nm in the pH range of 5.0–9.0, and it was rapidly decomposed by UV 222 with first-order rate constants of 0.0055 to 0.002 s −1 . ATL and the six other organic compounds were effectively degraded by the UV 222 /PI process under different conditions with the fluence-based rate constants generally two to hundred times higher than by UVA photolysis. Hydroxyl radical and ozone were confirmed as the major contributors to ATL degradation, while direct photolysis also played a role at higher pH or lower PI dosages. Degradation pathways of ATL were proposed including hydroxylation , demethylation , and oxidation. The high energy efficiency of the UV 222 /PI process was also confirmed. This study provides a cost-effective and convenient approach to enhance PI light-response activity for the treatment of micropollutants.
研究领域:
环境科学
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化学工程
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水处理
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PubMed
高影响因子
ACS ES&T Water
·
2024
·
IF 4.8
Jiawei Chen,Lin Du,Jian Liu,Lifeng Lin,Min Zhao,Lei Wang,Shaohua Chen,Jianzhi Huang
This study investigated innovative advanced oxidation processes (AOPs) combining far-UVC radiation at 222 nm with sodium percarbonate (SPC) to effectively remove methotrexate (MTX). UV222 significantly enhanced the direct photolysis and AOP degradation of MTX. •OH, CO3•–, and direct photolysis were primarily involved in the degradation, with their relative contribution being in the order •OH > CO3•– > direct photolysis. The fluence-normalized steady-state concentrations of both CO3•– and •OH in UV222/SPC were 7.76 and 4.05 times higher, respectively, than those in UV254/SPC. Transformation product analysis revealed distinct MTX degradation pathways and varied degradation rates of MTX substructures between the systems, with the order in UV254/SPC being 4-aminobenzamide (ABZ) > 2,4-diamino-6-(hydroxymethyl) pteridine (DHP) > l-glutamic acid (LG) and that in UV222/SPC being DHP > ABZ > LG, suggesting different reactivities of MTX moieties under each system. The presence of HCO3– and HA inhibited the MTX degradation, whereas NO3– promoted it, in the UV222/SPC system. In addition, UV222/SPC demonstrated a lower energy consumption compared to UV254/SPC, highlighting its potential for cost-effective wastewater treatment applications. This study offers new insights into the mechanisms of UV222/SPC systems and provides guidance for the development of technologies for the removal of emerging contaminants.
研究领域:
环境科学
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化学工程
·
水处理
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高影响因子
JOURNAL OF HAZARDOUS MATERIALS
·
2025
·
IF 11.3
Qing Bai,Qian-Yuan Wu,Yun-peng Wu,Yu-jia Nong,Zi-Bo Jing,Min-Yong Lee,Wen-Long Wang
Nitrate photolysis under UV222 irradiation has increasingly attracted attention as an advanced oxidation process, while fundamental mechanisms remain incompletely understood in various water matrices. This study revealed that the observed nitrate photodecay under UV222 represented a dynamic balance between innate photolysis and significant reformation, with the innate quantum yield (0.52 mol·Ein −1 ) substantially 7.1–11.0 times higher than the observed quantum yield (0.047–0.073 mol·Ein −1 ). Inorganic carbon (IC) and organic carbon (OC), ubiquitous water matrix components, influenced UV222/nitrate through distinctly different mechanisms: IC suppressed nitrate photodecay 12.6–58.3 % via enhancing ONOO⁻-mediated nitrate reformation without affecting innate photolysis, while OC promoted observed nitrate photodecay 19.6–54.5 % by scavenging reactive intermediates involved in nitrate reformation. UV222/nitrate effectively degraded various micropollutants via direct photolysis (e.g., N-nitrosodimethylamine), • OH oxidation (e.g., carbamazepine), and a combination of pathways including reactive nitrogen species (RNSs) oxidation (e.g., sulfamethoxazole). IC selectively promoted RNSs oxidation while suppressing • OH oxidation pathway, leading to selective effects for various micropollutant degradation and the increased nitration byproducts formation. In contrast, OC uniformly reduced all oxidation pathways through non-selective scavenging of reactive species. This mechanistic understanding explained the complex effects of water matrix components on UV/nitrate performance and provides a fundamental basis for optimizing UV222 driven advanced oxidation processes for micropollutant control in diverse water conditions.
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高影响因子
Coatings
·
2023
·Vol. 13
·期 6
·985
·
IF 3.4
Enguo Zhou,Yuan Liu,Huajin Yuan,Xiaoling Cheng,Yuanhong Zhong,Jiebing He,Xi Lu
This content introduces a novel Ultraviolet (UV)-shielding material, Zn2Al-MADS-LDH (MADS-LDH), which was synthesized through co-precipitation method to insert sodium dodecyl diphenyl ether disulfonate (MADS) into the interlayer of Zn2Al-LDH layered double hydroxide (LDH), to improve the photoaging resistance of polyvinyl chloride (PVC). The characterization results indicated that MADS-LDH had a host-guest interaction between the LDH host layer and MADS guest anion, and it exhibited superior UV absorption capabilities than Zn2Al-CO3-LDH (CO3-LDH) and a broader absorption spectrum compared to MADS. A series of LDHs/PVC film composite materials containing LDHs nanosheets were prepared by incorporating the prepared LDHs into a PVC matrix via a solvent casting method. As expected, the MADS-LDH/PVC film composite materials exhibited enhanced photoaging resistance. The results of photoaging tests indicated that MADS-LDH inhibits the rate of carbonyl generation during photoaging of MADS-LDH/PVC film composite materials, resulting in a decrease in the carbonyl index (ΔCl) and relative degradation rate (RDR) compared to pristine PVC film and CO3-LDH/PVC film composite materials. Furthermore, the study evaluated the influence of different UV light wavelength ranges, such as UVB (280~315 nm), UVC (200~280 nm), and UV (200~400 nm), on the aging performance of PVC film and LDHs/PVC film composite materials. The results demonstrated that UV had the highest aging effect on PVC composite films, followed by UVC and UVB. Therefore, the MADS-LDH is a highly efficient and promising UV-shielding material with excellent potential for wide applications in the field of PVC.Keywords:hydrotalcite;polyvinyl chloride;intercalation;UV-shielding materials;film composite materials
研究领域:
材料科学
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高分子化学
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光化学
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纳米技术
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DOI
高影响因子
WATER RESEARCH
·
2024
·
IF 11.4
Yu-Jia Nong,Qian-Yuan Wu,Yun-Peng Wu,Ju-Won Lee,Min-Yong Lee,Wen-Long Wang
The KrCl-excimer lamp, emitting far-UVC light at 222 nm (UV222), offers a promising alternative to conventional UVC light at 254 nm (UV254) for the photolysis of organic pollutants and the activation of radical sensitizers. This study was aimed to investigate the efficiencies of UV222 in the treatment of halogenated aromatics, focusing on its performance in degradation, dechlorination and detoxification. Chlorophenols, representative recalcitrant and toxic halogenated aromatics, were used as target pollutants. The pathways of direct photolysis, photooxidation and photoreduction under UV222 illumination were compared. UV222 outperformed UV254 in photolyzing chlorophenols (1.4−34.1 times faster), especially protonated chlorophenols, due to substantially higher UV absorption (17.1−108.0 times) and quantum yields (2.1−3.4 times). The quantum yields of chlorophenols were influenced by the inducive electron-withdrawing effect of Cl-substitutes. Moreover, UV222 improved the dechlorination of chlorophenols to 95 % compared to 60 % by UV254. The introduction of radical sensitizer (e.g., H 2 O 2 , nitrate, and sulfite) reduced 4-chlorophenol photolysis by competing for UV222 absorption, though the sensitizers partially increased radical oxidation via generating • OH or e aq − . UV222 photolysis of 4-chlorophenol increased the toxicity by 88.6 times through forming toxic intermediates (e.g., hydroquinone and resorcinol). Notably, • OH and e aq − (i.e., UV222/H 2 O 2 and UV222/sulfite) increased the dechlorination and • OH (i.e., UV222/H 2 O 2 ) detoxified the mixture solution. Moreover, UV222 photolysis remained effective for 4-chlorophenol removal in real paper-mill wastewater, indicating the potential application of KrCl* lamp UV222.
研究领域:
环境科学
·
化学工程
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PubMed
高影响因子
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