Nature Communications
·
2022
·Vol. 13
·期 1
·1-10
·
IF 17.694
Zhang Pingping,Yang Gaoling,Li Fei,Shi Jianbing,Zhong Haizheng
Photolithography has shown great potential in patterning solution-processed nanomaterials for integration into advanced optoelectronic devices. However, photolithography of perovskite quantum dots (PQDs) has so far been hindered by the incompatibility of perovskite with traditional optical lithography processes where lots of solvents and high-energy ultraviolet (UV) light exposure are required. Herein, we report a direct in situ photolithography technique to pattern PQDs based on the photopolymerization catalyzed by lead bromide complexes. By combining direct photolithography with in situ fabrication of PQDs, this method allows to directly photolithograph perovskite precursors, avoiding the complicated lift-off processes and the destruction of PQDs by solvents or high-energy UV light, as PQDs are produced after lithography exposure. We further demonstrate that the thiol-ene free-radical photopolymerization is catalyzed by lead bromide complexes in the perovskite precursor solution, while no external initiators or catalysts are needed. Using direct in situ photolithography, PQD patterns with high resolution up to 2450 pixels per inch (PPI), excellent fluorescence uniformity, and good stability, are successfully demonstrated. This work opens an avenue for non-destructive direct photolithography of high-efficiency light-emitting PQDs, and potentially expands their application in various integrated optoelectronic devices.
研究领域:
材料科学
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光电技术
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纳米技术
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DOI
PubMed
高影响因子
Small
·
2024
·
IF 13
Haoying Wang,Junfeng Xiong,Yuzhen Cai,Wei Fu,Yukun Zhong,Teng Jiang,U Kei Cheang
All-inorganic cesium lead halide (CsPbX 3 , X = Cl, Br, I) perovskite nanocrystals have drawn great interest because of their excellent photophysical properties and potential applications. However, their poor stability in water greatly limited their use in applications that require stable structures. In this work, a facile approach to stabilize CsPbBr 3 nanowires is developed by using SU-8 as a protection medium; thereby creating stable CsPbBr 3 /SU-8 microstructures. Through photolithography and layer-by-layer deposition, CsPbBr 3 /SU-8 is used to fabricate bilayer achiral microswimmers (BAMs), which consist of a top CsPbBr 3 /SU-8 layer and a bottom Fe 3 O 4 magnetic layer. Compared to pure CsPbBr 3 nanowires, the CsPbBr 3 /SU-8 shows long-term structural and fluorescence stability in water against ultrasonication treatment. Due to the magnetic layer, the motion of the microswimmers can be controlled precisely under a rotating magnetic field, allowing them to swim at low Reynolds number and tumble or roll on surfaces. Furthermore, CsPbBr 3 /SU-8 can be used to fabricate various types of planar microstructures with high throughput, high consistency, and fluorescence properties. This work provides a method for the stabilization of CsPbBr 3 and demonstrates the potential to mass fabricate planar microstructures with various shapes, which can be used in different applications such as microrobotics.
研究领域:
材料科学
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纳米技术
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微制造
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光子学
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机器人技术
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产品关联
DOI
PubMed
高影响因子
ACS Applied Bio Materials
·
2018
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IF 0
Jing Dai,Na Kong,Yi Lu,Yangyang Yuan,Qiong Wu,Min Shi,Siyi Zhang,Yuzhe Wu,Wenbo Peng,Pengyu Huang,Xuexin Chen,Jinkang Gong,Yuan Yao
The physical properties and topological cues of a micro/nanopattern affect both cell functional activity and tissue regeneration. In this study, we developed a bioinspired approach to fabricate a microconical pattern mimicking the wing structure of beetle Coleoptera. The bioinspired micropattern with multistructural hierarchy was first screened from eight representative insect families of coleopteran. Then, we fabricated a conical micropattern through a two-step nanoimprint lithography technology. We found that human adult fibroblast cells on the bioinspired micropattern substrate had a larger spread area and higher proliferation efficiency than those on flat polydimethylsiloxane. The physical properties and topological cues affect cell functional activity. Through in situ cell motility tracking, we found that conical pillars provided specific attachment points as a mechanotransduction foundation for cell attachment to spread. The holding pillar on the bioinspired surface facilitates the actin and vimentin filament assembly into mature straightened bundles in the cytoplasm. This bioinspired substrate is transparent, flexible, and easy to fabricate. Moreover, it provides a novel in situ platform to investigate cell behaviors.
研究领域:
生物材料
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细胞生物学
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组织工程
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纳米技术
✓ 已验证
产品关联
DOI
PubMed
Journal of Materials Chemistry C
·
2023
·Vol. 11
·期 44
·15591-15598
·
IF 6.4
Chenchao Huang,Yuan-Qiu-Qiang Yi,Zishou Hu,Shuo Zhang,Xinzhou Wu,Xiaolian Chen,Wenya Xu,Wenming Su,Zheng Cui
Photolithography is a standard technique for high resolution patterning of electronic devices. This study presents a new tris-diazo compound (X8) as a carbene crosslinker which responds to UV photons and can be directly patterned by photolithography. The tris-diazo compound (X8) has been successfully applied to fabricate solution-processable electrochromic polymer (ECP) displays. Upon exposure to UV light of 254 nm wavelength, the blend of X8 (≤5 wt%) with ECP (PProDOT, poly(3,4-propylenedioxythiophene)) can cross-link, exhibiting a ∼93% solvent resistance whereas the pristine PProDOT does not cross-link at all. The electrochromic devices (ECDs) based on the crosslinked PProDOT showed an exceptional stability of 300 000 operational cycles, with both bleaching and coloring time of 0.5 s without obvious deterioration. With lithographical patterning, a minimum 50 μm size of display pixel has been realized, which paves the way for future large-area and low-cost electrochromic display applications.
研究领域:
材料科学
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电化学
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显示技术
✓ 已验证
产品关联
DOI
高影响因子
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
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2019
·Vol. 31
·期 2
·1547-1553
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IF 2.195
Jiang Wenya,Peng Cong,Yuan Yanyu,Yang Shibo,Li Xifeng
In this paper, the indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) with chitosan (CS) gate dielectric are prepared by the conventional photolithography technique on a pilot line. As-prepared devices on 200 × 200 mm substrate is very uniform, and have good performance of high on/off drain current ratio ~ 10 −6 , low subthreshold swing ~ 0.24, low-threshold voltage ~ 0.20 V and high-visible light transmittance > 90%. The glucose oxidase is drop-cased on the CS gate dielectric surfaces to make fully transparent CS-based IGZO TFTs with sensitivity to glucose. It is found that the current noticeably changes with increasing glucose concentrations. Herein, the glucose detection range from 0.5 to 30 mM covers the normal range of human blood glucose concentration. Moreover, the response time for glucose sensing is < 10 s, which is effective in detecting glucose. The results suggest that the CS-based IGZO TFTs can be used to detect glucose and provides a simple process to achieve low-cost- and larger-area fabrication of biosensors.
研究领域:
电子学
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材料科学
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生物传感
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纳米技术
✓ 已验证
产品关联
DOI
高影响因子
Aggregate
·
2024
·
IF 13.9
Ziwei Yuan,Meng Xie,Jianlei Qian,Wenjie Fan,Menglu Li,Liao Guo,Yan Sun,Wenxin Fu
The high curing temperatures required for traditional benzocyclobutene (BCB) materials have posed limitations on their applicability in high-temperature-sensitive fields. To address this challenge, our work focuses on the synthesis of a novel tetraphenylethylene (TPE)-functionalized BCB monomer, TPE–BCB, achieved through the introduction of an ether bond onto the BCB's four-membered ring via Williamson reaction. TPE–BCB demonstrates remarkable low-temperature curing properties, characterized by a ring-opening peak temperature of 190°C, representing a reduction of 60°C compared to conventional BCBs. Fully cured TPE–BCB resins exhibit exceptional dielectric and mechanical properties, coupled with minimal water absorption. Additionally, the incorporation of TPE with aggregation-induced emission characteristics enhances the resins’ luminescence and photolithographic capabilities. Notably, our TPE–BCB resins achieve impressive photolithography performance with a resolution ratio of up to 10 μm. In contrast to conventional BCB-functionalized resins, TPE–BCB offers the dual advantage of low-temperature curing and luminescence. This development marks a significant step in the advancement of low-temperature curing BCB materials and serves as a pioneering example in the realm of multilayer wafer bonding materials.
研究领域:
材料科学
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聚合物化学
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电气工程
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光子学
✓ 已验证
产品关联
DOI
高影响因子
Acta Biomaterialia
·
2022
·
IF 10.633
Yilun Luo,Peiqi Yuan,Sentao Hu,Hanwen Wang,Haiqi Zhang,Lie Ma
Designing biomaterials with precise immunomodulation can help to decipher the dynamic interactions between macrophages and biomaterials to match the tissue healing process. Although some advanced stimuli-responsive immunomodulatory biomaterials were reported for cell dynamic modulation, while most triggers need external stimuli by manual intervention, there would be the inevitable errors and uncertainties. Thus, developing immunomodulatory biomaterials with adaptive abilities, which can recognize the inflammation signals, change their properties spatiotemporally under the microenvironment triggers, and provide feedback to realize macrophages modulation in different healing stages, has become a promising strategy. In this work, we developed an inflammation-adaptive Arg-Gly-Asp (RGD) -patterned surface for spatiotemporal immunomodulation of macrophage. We fabricated a methacrylated hyaluronic acid (MA-HA) hydrogel with thiol-functionalized RGD-patterned surface by employing photolithography technology. Then, thiol-functionalized RGD contained ROS-cleavable linker was filled the remaining sites and consequently, a dynamic surface with temporary homogeneous RGD was obtained. Under the overproduction of ROS by the inflammation-activated macrophages, the linker was cleaved, and the homogeneous RGD surface was transformed to the RGD patterned surface, which triggered elongation of macrophages and consequently the upregulated expressions of arginase-1, IL-10 and TNF-β1, indicating the polarization toward to anti-inflammatory phenotype. Developing inflammatory environment-adaptive surface for spatiotemporal modulation of macrophages polarization provides a precise and smart strategy for the healing-matched immunomodulation to facilitate healing outcomes. Statement of significance Designing biomaterials with precise immunomodulation can help to decipher the dynamic interactions between macrophages and biomaterials to match tissue repair process. Some immunomodulatory biomaterials were reported for cell dynamic modulation, while most triggers need external manual intervention. Thus, we developed an immunomodulatory biomaterial with inflammation-adaptive patterned surface, which can recognize abnormal signals and change its properties spatiotemporally under the microenvironment triggers, and provide feedback to realize macrophages modulation in different stages. The dynamic surface can adapt to the changes of microenvironment and dynamically to match the cell behavior and tissue healing process on demand without external manual intervention. Additionally, the surface achieves the balance of macrophages with pro- and anti-inflammatory phenotypes in the tissue repair process.
研究领域:
生物材料
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免疫学
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组织工程
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生物医学工程
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产品关联
DOI
PubMed
高影响因子
Small
·
2025
·
IF 12.1
Bin Wang,Mulin Li,Junyi You,Fengyi Zhang,Rongqiu Lv,Weiwei Wang,Wenbin Zhou,Jun Chen,Haibo Zeng
Incorporating perovskite quantum dots (PQDs) into photoresist (PR) and utilizing mature photolithography processes is an optimal strategies for achieving patterning, perfectly aligning with the requirements for large-scale manufacturing. Consequently, enhancing the intrinsic stability of the red-emitting CsPbBrI 2 QDs is paramount to enable their direct mixing with PR for subsequent lithographic processing. Herein, a B-site-doped CsPbBrI 2 QD is designed by introducing Sr 2 ⁺. This doping enhances the lattice stability and partially repairs surface defects. The Sr-doped CsPbBrI 2 QDs solution maintains stability for 30 days, retaining 93.7% of its initial photoluminescence (PL) intensity with a PL peak barely shift, while the films show enhanced thermal tolerance. Owing to the high stability, the Sr-doped CsPbBrI 2 QDs are mixed with commercial PR, and the blend maintained a photoluminescence quantum yield (PLQY) of 61%. Photolithographic patterned films achieve the minimum feature size of 88.39 µm with better uniformity and luminescence intensity. Encapsulated within the PR matrix, the QD-PR films confer exceptional water stability, retaining strong luminescence even after 48 h immersion, and resistance to polar solvents. Sr-doped CsPbBrI 2 QDs and the commercial PR synergistically overcome compatibility barriers, facilitating simple and efficient photolithographic patterning.
研究领域:
材料科学
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纳米技术
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光电子学
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半导体器件
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光刻技术
✓ 已验证
产品关联
DOI
PubMed
高影响因子
ACS Applied Nano Materials
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2025
·
IF 5.5
Tao Jiang,Jin Zhang,Miaomiao Han,Yadong Liu,Shengxiang Ji
Directed self-assembly (DSA) of block copolymers (BCPs) has shown great potential for creating sub-10 nm patterns for advanced semiconductor manufacturing. It is necessary to develop block copolymers with high Flory–Huggins interaction parameters (χ) and similar surface energies (γ) between constituent blocks. Herein, this work presents the synthesis of lamellae-forming poly(4-chlorostyrene-b-methyl acrylate) (P4ClS-b-PMA) and investigates the DSA behavior of P4ClS-b-PMA. P4ClS-b-PMA has a higher χ than poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and poly(styrene-b-methyl acrylate) (PS-b-PMA), resulting in the smallest achievable period (L0) to 14.1 nm. Notably, the P4ClS and PMA blocks possess similar γ values, which facilitates the formation of perpendicularly orientated domains in P4ClS-b-PMA films on neutral, substrate-modified silicon wafers under thermal annealing. 7× density multiplication DSA of P4ClS-b-PMA is successfully demonstrated in films on chemical patterns fabricated by 193 immersion (193i) lithography, with a feature size of about 7.5 nm. These findings confirm that P4ClS-b-PMA could be a potential candidate for DSA lithography.
研究领域:
材料科学
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高分子化学
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纳米制造
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半导体制造
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光刻技术
✓ 已验证
产品关联
DOI
高影响因子
Small
·
2025
·
IF 12.1
Shicui Xing,Dong Wang,Zhipeng Fan,Wenbing Kang,Qianqian Wang,Xu Wang
The rapid advancement of extreme UV lithography has intensified the demand for photoresist (PR) innovation, with organic–inorganic hybrid metal oxide photoresists (MORs) emerging as a promising next-generation platform. The design of organic ligands in MORs is crucial, as these functional ligands tailor the physical, chemical, and optical properties of the PR to meet the stringent resolution, roughness, and sensitivity requirements of advanced lithography. Herein, a mixed-ligand strategy is reported for high-resolution nanolithography using titanium-oxide (TiO 2 ) PR functionalized with benzoic acid and fluorobenzoic acid ligands. Upon radiation exposure, the electron-triggered decarboxylation of these ligands, combined with fluorinated groups, initiates new reaction pathways, including C─F bond cleavage and Ti─F structure formation. These pathways drive the solubility transition of the nanoparticles during development, resulting in a negative pattern. Evaluated via electron beam lithography, these mixed-ligand-modified TiO 2 PRs achieve high-quality lines with feature sizes down to 12 nm and line width roughness of ≈1.3 nm, a substantial improvement over monoligand benzoic acid systems under identical conditions. These results demonstrate the effectiveness of the mixed-ligand strategy in enhancing the imaging capability of MORs and provide valuable insights for further development in advanced lithography.
研究领域:
纳米技术
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材料科学
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半导体制造
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光刻技术
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有机无机杂化材料
✓ 已验证
产品关联
DOI
PubMed
高影响因子
EUROPEAN POLYMER JOURNAL
·
2025
·
IF 6.3
Dongsheng Xie,Anjie Yang,Liangwei Li,Haitian Wei,Yameng Shi,Na Li,Xiang Gao
Photoresists are critical materials for patterning high-resolution features in semiconductor manufacturing. ArF photoresist polymers, which are predominantly multicomponent acrylate copolymers, cannot be synthesized via living anionic polymerization. Consequently, conventional free radical polymerization (FRP) remains the predominant method for their production. However, FRP struggles to meet the stringent requirements for high-performance photoresists, which demand well-defined molecular weights, narrow polydispersity ( Đ ), and excellent batch-to-batch consistency. Herein, we report a robust synthesis of ArF photoresist polymers by integrating continuous-flow technology with reversible addition–fragmentation chain transfer (RAFT) polymerization. This process maintains high output quality stability and controllability, yielding polymers with well-defined molecular weights and narrow polydispersity ( Đ < 1.2). It achieves over 90 % conversion within 200 min and is applicable to microchannel systems with solids content exceeding 40 wt%, meeting commercially viable polymerization results. Furthermore, we introduce an efficient and green method for removing thiocarbonylthio end groups via aqueous hydrogen peroxide treatment under mild conditions. This approach prevents the degradation of thermal stability and lithographic sensitivity performance typically caused by residual RAFT terminal groups. The RAFT-derived, desulfurized photoresist produced patterns with significantly lower line-edge roughness than the FRP-based material, demonstrating superior lithographic performance. This end group removal strategy offers high throughput, excellent efficiency, and seamless compatibility with continuous-flow processes, highlighting its strong potential for industrial adoption.
研究领域:
高分子化学
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材料科学
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半导体技术
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光刻技术
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绿色化学
✓ 已验证
产品关联
DOI
高影响因子
RSC Advances
·
2014
·Vol. 4
·期 40
·21093-21100
·
IF 3.708
Juan Liu,Yu Qiao,Zhengping Liu,Liyuan Wang
With poly(4-hydroxylstyrene) (PHS) as a raw material, a new type of polymeric photoacid generator (PAG) is synthesized with sulfonium perfluoroalkyl sulfonate groups bonded onto part of the benzene rings. The phenolic hydroxyl groups are esterified to increase the solubilities of the polymeric sulfonium salts in organic solvents. Upon irradiation to 254 nm light, the sulfonium units in the polymer effectively decompose to generate sulfonic acid. The photolysis is confirmed by UV spectroscopy and the generation of sulfonic acids which catalyze the decomposition of the t-BOC protection group of the polymeric PAGs. Making use of the polymeric PAGs, positive-tone chemically amplified 248-nm photoresists can be formed by them and ester acetal polymer with high acidolytic activity. The photolithography performance of the photoresist was evaluated using a KrF laser exposure system with high photosensitivity and resolution. This novel kind of polymeric sulfonium salt PAG is applicable for advanced chemically amplified resist materials.
研究领域:
高分子化学
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光刻技术
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材料科学
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半导体制造
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有机电子学
✓ 已验证
DOI
高影响因子
危险品化学品经营许可证（带存储）