Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.
Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
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英文别名
Tris(tert-butoxy)silanol | Silicic acid (H4SiO4), tris(1,1-dimethylethyl) ester | hydroxy-tris[(2-methylpropan-2-yl)oxy]silane | tris(t-butoxy)silanol | Tri-t-butoxysilanol | Tri-tert-butylhydrogenorthosilicate | Tris(tert-butoxy)silanol, packaged for use in deposition systems | Tri-tert-butyl hydrogen orthosilicate