G2608226计算溶液所需的质量、体积或浓度。
为什么选择此级别
，适用于对基线干扰要求严格的色谱和分析工作流程。
储存与运输
室温。常规运输 。请查阅批次 COA 获取详细规格。
质量文档
SDS、COA、产品数据表及规格说明书均可下载。可通过批号查询获取批次 COA。
文献证明
在色谱分析、有机合成和交叉偶联反应领域已被 0 篇同行评审文献引用。
概述
Aluminum Etchant Type F is a stable preparation used to etch aluminum or aluminum-silicon metallizations on silicon devices and in integrated circuit applications. Aluminum contacts are defined and interconnections are formed. Aluminum Etchant Type F is formulated with unique properties easily overcome many of the difficulties experienced in aluminum etch processes such as residue. The aluminum metallization and etching process using photo-lithographic techniques is basic to the semiconductor and microelectronic technology.The Aluminum Etchant Type F is highly compatible with many of commercial photoresists and permit delineation into high resolution patterns. Metal line width of 1 mil and separations less than 5 microns are feasible. The high resolution is practical with the Aluminum Etchant Type F because lifting of photoresist patterns does not occur and undercutting is minimized.Aluminum Etchant Type F should not be used or stored in glass or Pyrex containers.Aluminum metallizations up to 25,000 A are vacuum deposited on the silicon slice, coated with a photoresist, and UV exposed using an appropriate photographic mask. The resist is developed to protect the aluminum where interconnections are desired. Then the unprotected areas of the aluminum are removed by etching with the Aluminum Etchant Type F, followed by a water rinse.Etching time is dependent upon the etchant temperature and the aluminum film thickness. When etching thick aluminum films, a higher etch rate is required; thus a higher etchant temperature should be used. Likewise, for thinner aluminum films, slower etch rates are desired and a lower etchant temperature should be chosen.At a specific etchant temperature, the etching time is given by the following formula:Etching time (second) + Film Thickness (Å)/ Etch Rate (Å/sec)where Etch Rate at 25°C 30 Å/sec; at 40°C 80 Å/sec.
规格
英文别名
Aluminum etching solution for Al and Al-Si metallization
英文名称
Aluminum Etchant Type F
储存条件
室温
运输条件
常规运输
名称和识别符
分子类型
未知
技术文档
高级数据
安全和危险性（GHS）
信号词
危险
危险声明
H226: 易燃液体和蒸气
H290: 可能腐蚀金属
H302: 吞食有害
H314: 造成严重的皮肤灼伤和眼睛损伤
预防措施声明
P210: 远离热源，热表面，火花，明火和其他点火源。 - 禁止抽烟。
P280: 戴防护手套/穿防护服/戴防护眼罩/戴防护面具。
P301+P330+P331: 如误吞咽：漱口。不要诱导呕吐。
P303+P361+P353: 如皮肤（或头发）沾染：立即脱掉所有沾染的衣服。用水清洗皮肤/淋浴。
P301+P312+P330: 如误吞咽：如感觉不适，呼叫急救中心/医生。漱口
质检证书（CoA,COO,BSE/TSE 和分析图谱)
技术文档和文章
溶液计算器
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